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Multi-chip stacking structure

A multi-chip, chip technology, applied in electrical components, electrical solid-state devices, circuits, etc., can solve problems such as lack of EDA design tools, inconsistent specifications and standards, and increased heat dissipation design complexity.

Inactive Publication Date: 2011-05-04
黄婷婷
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] (1) Lack of EDA design tool assistance;
[0009] (2) Increasing TSV settings may increase the complexity of thermal design;
[0011] (4) Combination of different functional systems; and
[0012] (5) Specifications and standards are not uniform

Method used

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Examples

Experimental program
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Embodiment Construction

[0048] see figure 1 as shown, figure 1 It is an embodiment of the multi-chip stack structure of the present invention, which includes:

[0049] A bottom layer 10, which is a substrate 101 with a line redistribution layer (Redistribution layer, RDL) 102;

[0050] A first chip 11, which at least includes a non-conductor layer 110 and a metal layer 111, the non-conductor layer 110 is provided with a metal-filled via 112, and the metal layer 111 is inverted (flipped) and arranged on the line reconfiguration layer 102 of the bottom layer 10 superior;

[0051] A first stacked wafer 12, which is arranged on the first wafer 11, comprising:

[0052] a metal layer 121;

[0053] A non-conductor layer 120, which is provided with a metal-filled channel 122, the metal-filled channel 122 is electrically connected with the metal-filled channel 112 of the non-conductor layer 110 of the first wafer 11; and

[0054] A second stacked wafer 13, which is arranged on the first stacked wafer 12,...

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Abstract

The invention discloses a multi-chip stacking structure, which comprises a bottom layer, a first chip, at least two stack chips and a non-conductor layer, wherein the bottom layer is a substrate provided with a circuit reconfiguration layer; the first chip at least comprises a non-conductor layer and a metal layer; the non-conductor layer is provided with a metal filling channel; the metal layer is invertedly arranged on the circuit reconfiguration layer of the bottom layer; the at least two stack chips are stacked upwards in turn; each stack chip at least comprises a metal layer; the non-conductor layer is provided with a metal filling channel; the metal filling channel is electrically connected with the metal layers of the correspondingly stacked stack chips; and the metal filling channel of the non-conductor layer stacked downmost is electrically connected with the metal filling channel of the non-conductor layer of the first chip. Due to the structure, the increase of complexity of a heat dissipation design due to the increase of the number of metal filling layers can be greatly improved, and the heat dissipation efficiency is improved.

Description

technical field [0001] The present invention relates to a multi-chip stacking structure, in particular to a multi-chip stacking structure with a good electrical planning structure and a multi-chip stacking structure through metal filling channels. Background technique [0002] In order to improve the performance and capacity of semiconductor packages, in order to comply with the trend of small or portable electronic products that are increasingly focused on thinner, smaller and higher performance, the demand for semiconductor devices that can increase the density of chips is also increasing. [0003] The traditional two-dimensional integrated single system chip (system-on-chip, SOC), with the help of the industry commonly known as Moore's Law, through the semiconductor manufacturing process, the transistors on the chip are made smaller and smaller, so as to make smaller electronic products It can have better performance, but physicists found that when the gate used to contro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/52H01L25/00
Inventor 黄婷婷陈贤德
Owner 黄婷婷
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