Amorphous alloy-based optical focusing lens and preparation method thereof

Abstract

The invention discloses an amorphous alloy-based optical focusing lens and a preparation method thereof. The optical focusing lens is prepared from an amorphous alloy material, wherein the amorphous alloy is a Zr-Al-Ni-Cu alloy, a Al-TM-RE alloy, a AL-TM-RE-Be alloy, a Fe-Si-B-P-Be alloy, a Au-Si-Be alloy, a Ag-Ge-Be alloy, a Mg-Al-RE-Be alloy or the like, wherein the TM is a transition metal such as Ni, Co, Ag, Pt or the like; and the RE is a rare earth element such as Y, Gd, Ce, La or the like. The amorphous alloy-based optical focusing lens has a high focusing effect on X-rays by utilizing a low light absorption coefficient and a refractive index close to 1 thereof, can achieve nanoscale or even sub-nanoscale focusing precision, and has low preparation cost, more excellent large-area and large-volume processing performance compared with a diamond-type focusing lens, and the processing precision which can reach atomic precision.

Description

Technical field [0001] The invention belongs to the technical field of advanced material processing and new material application, and specifically relates to an amorphous alloy-based optical focusing lens and a preparation method thereof. Background technique [0002] According to the point resolution formula of electromagnetic waves caused by electromagnetic wave diffraction The highest resolution is related to the electromagnetic wave wavelength λ, the refractive index n of the medium and the half angle θ of the electromagnetic wave used, where d is the point resolution; λ is the electromagnetic wave wavelength; n is the vacuum relative refractive index of the point source and the focusing mirror in the medium ; Θ is the half angle of the aperture of the incident electromagnetic wave. With the help of focusing lens, the resolution of electromagnetic wave imaging such as electron beam and visible light is mainly restricted by the wavelength of its electromagnetic wave, which ca...

AI Technical Summary

Problems solved by technology

In the wavelength range of X-rays, the refractive index n of all traditional materials is close to 1, and it is difficult to obtain a high aperture numerical aperture (N at = nsinθ)

Second, any material can absorb electromagnetic waves, and most materials absorb strongly in the wavelength range of X-rays, so that the intensity of X-rays decays rapidly with the incident depth, weakening the refracted and transmitted X-rays, making it difficult to obtain a high enough contrast. Affects obtaining a clear imaging effect

Theoretically, the Keynor-type lens can achieve a resolution of 2nm, but it can only focus the X-ray with an incident wavelength of 0.06nm to 47nm, and the scale of the X-ray formed by focusing the planar optical waveguide with an energy of 13.3KeV can only be up to 26nm

There are three main reasons for this. One is the use of traditional materials for making lenses. The defects and grain size of the internal crystal structure are much larger than 2nm. The absorption, scattering and / or diffraction produced by the internal grains and defects not only greatly reduce the X-ray intensity Attenuation will also X-ray astigmatism; the second is limited by the precision of the current micro-processing technology and the crystal structure characteristics of traditional materials, the surface roughness of the prepared lens is much greater than 2nm, and further surface scattering and absorption of X-rays, Greatly improve the astigmatism of X-rays; the third is due to the low refractive index and high light absorption coefficient of traditional materials; from the point resolution theoretical formula of electromagnetic waves It can be seen that a particularly high resolution cannot be obtained, so reference 5: Stein, A.; Evans-Lutterodt, K.; Taylor, A. In Kinoform lenses: toward nanometer resolution, Proc. SPIE optics east, Boston, MA, USA, Oct.23-25, 2005, 2005; Boston, MA, USA, 2005. and references 6Aristov, V.V.; Shabel'nikov, L.G., Recent advances in X-ray refractive optics.Physics-Uspekhi 2008, 51, (1) , 57-77. It is recorded that it is necessary to start from the refractive index and light absorption index of the material itself, prepare or select a certain high refractive index and low light absorption coefficient, and optimize the crystal structure and composition of the material at the same time to obtain the grain size and For crystal structure materials with defects much smaller than 2nm, choose appropriate micro-nano preparation technology, reduce the surface roughness of the lens, prepare X-ray focusing mirror with high focusing effect, and obtain high-resolution X-ray imaging or scanning spot

The current X-ray technology mainly includes the well-known X-ray diffraction spectroscopy (XRD) and synchrotron radiation X-ray detection technology (such as X-ray absorption fine structure technology: XAFS), but these technologies basically focus on X-rays at the millimeter level

Even if the high-energy synchrotron radiation X-rays are focused to a few microns at most by a strong magnetic field, the existing technology can only characterize the structure of bulk materials, and it is difficult to characterize nano or sub-nanometer structures, which greatly limits X-ray application range

Images