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Method for cleaning metal nanoparticles

A technology of metal nanoparticles and metals, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., to achieve the effect of increasing the filling factor and reducing the thickness

Inactive Publication Date: 2011-08-31
SAMSUNG ELECTRO MECHANICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This conventional method can lead to condensation between particles during the solvent evaporation process when the solvent is evaporated by heating

Method used

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  • Method for cleaning metal nanoparticles
  • Method for cleaning metal nanoparticles
  • Method for cleaning metal nanoparticles

Examples

Experimental program
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preparation example Construction

[0027] When metal nanoparticles are prepared by a conventional preparation method using an organic solvent, several kinds of impurities may remain on the surface of the metal nanoparticles. Surfactants, whether polar or non-polar, can be removed by washing with ethanol and toluene. However, organic substances and chloride ions used as reactants may remain on the surface of the particles even with such cleaning, so that the purity of the metal nanoparticles is reduced.

[0028] Therefore, treatment with an organic acid or alcohol solution is required after the treatment with ethanol and toluene in order to remove such organic substances. The alcohol may be a C1-C16 alcohol, especially a C1-C10 alcohol. When an alcohol having more than 16 carbon atoms is used, it may be solid in the oil phase and has low solubility in water.

[0029] figure 2 Shown is the cleaning efficiency of the organic substance when the organic substance is cleaned with ethanol or methanol or an aqueous...

Embodiment 1

[0042] Example 1: Removal of Organic Substances from Metal Nanoparticles

[0043] Metal nanoparticles prepared in an organic solvent phase including amine and surfactant are recovered by using a centrifuge. The recovered metal nanoparticles were washed with methanol (MeOH) while sonicating for 10 minutes. Use ethanol (EtOH), methanol+ethanol (MeOH+EtOH), methanol+pure water (MeOH+H 2 O (v / v 9:1)), and ethanol + pure water (EtOH + H 2 O (v / v 9:1)) carried out the same cleaning process. figure 2 The surface of the nanoparticles after each cleaning process obtained by FT-IR (Fourier Transform Infrared Spectroscopy, Perkin-Elmer) is shown. It should be noted that when no water was used, a peak appeared indicating the presence of organic species remaining on the surface of the nanoparticles, whereas when an aqueous cleaning solution was used there was no peak of organic species and the curve was smooth.

Embodiment 2

[0044] Example 2: Removal of chloride ions from the surface of nanoparticles

[0045] After washing the nanoparticles twice with ethanol and twice with toluene, the nanoparticles were washed with acetic acid while performing sonication for 10 minutes. Use methanol + pure water (MeOH+H 2 O (9:1, v / v)) and ammonium bicarbonate solution (10 wt.%) were subjected to the same cleaning process. Each nanoparticle was then dried and analyzed for the presence of residual chloride ions on the surface of the nanoparticles by using ion chromatography (IC), as shown in Table 1. It should be noted that chloride ion removal was best when ammonium bicarbonate was used to wash the nanoparticles.

[0046] Table 1

[0047]

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PUM

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Abstract

It relates to a method for removing a surfactant, organic materials and chlorine ions remained on the surface of metal nanoparticles, prepared on an organic solvent phase including a surfactant. The method for cleaning metal nanoparticles herein is efficient to remove organic materials or chlorine ions remained on the surface of the nanoparticles. Not less than 90% of impurities may be removed by this method. As a result, the thickness of a multi layer ceramic capacitor (MLCC) can be reduced and a packing factor can be improved so that it allows thinner multi layer ceramic capacitors and improved utilities of metal nanoparticles as fuel cell catalysts, hydrogenation reaction catalysts, alternative catalysts of platinum (Pt) in chemical reactions and the like.

Description

[0001] References to related applications [0002] This application claims the benefit of Korean Patent Application No. 10-2010-0018163 filed with the Korean Intellectual Property Office on February 26, 2010, the entire disclosure of which is hereby incorporated by reference. technical field [0003] The present invention relates to a method for removing a surfactant, an organic material (organic material), and chloride ions present on the surface of metal nanoparticles prepared by using an organic solvent including a surfactant. Background technique [0004] Korean Patent No. 10-0845688 discloses a method for removing Ni(OH) present on the surface of nickel particles by using a reducing organic solvent 2 and impurities to increase the purity of metals by removing nickel hydroxide and metal oxides. JP H4-235201A discloses a method for increasing the tap density of metal powder by adding the metal powder to an organic solvent including stearic acid and evaporating the organi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/04B08B3/12
CPCC11D7/247C11D7/12C11D7/261C11D11/0029C11D7/265
Inventor 徐正旭南孝昇柳荣球金京美金宗植金兑浩
Owner SAMSUNG ELECTRO MECHANICS CO LTD