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Lid holding jig

A technology for holding fixtures and lids, which is used in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., and can solve the problem of undisclosed equipment structures and achieve the effect of improving operability.

Active Publication Date: 2011-12-21
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this patent document 1, there is no disclosure of a specific device structure in which the above-mentioned movable bearing stably holds the cover body.

Method used

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Examples

Experimental program
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Embodiment Construction

[0048] Below, refer to Figure 1 ~ Figure 4 A configuration example of the cover holding jig 1 according to the embodiment of the present invention will be described. Such as figure 1 As shown in the perspective view of , the cover holding jig 1 of this example includes: an inversion frame 2 as a holding part for holding the cover 83 of the processing chamber 81; The fixing mechanism 4 of the body 83; the support stand 31 that holds the above-mentioned reversing frame 2 in a rotatable manner around the rotation shaft 52; and the base that is provided on the bottom side of the support stand 31 and supports the support stand 31 on the bottom surface plate 32.

[0049] The lid holding jig 1 of this example is configured to hold, for example, a lid 83 of a processing chamber 81 for processing a rectangular FPD substrate (hereinafter abbreviated as substrate S) having a size of about 2.2 m on one side and about 2.5 m on the other side. A case in which the lid body 83 has a size...

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PUM

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Abstract

The present invention provides a jig for retaining a lid, which is capable of stably retaining the lid of a processing chamber and enabling the lid to overturn. The jig for retaining a lid retains the lid (83) arranged at the upper portion of the processing chamber (81) in the state of dismounting from the lid, wherein a retaining unit (2) retains the periphery of lid (83), substrates (31,34,53) support the retaining unit (2) in a manner of freely spanning around a horizontal rotation shaft (52) in order to allow the lid (83) retained on the retaining unit (2) to rotate in the anti-clockwise direction, a fixing mechanism (4) allows fixing members to move between the fixed position of the lid (83) fixed therein and the fixed open position of the lid (83) opened therein relative to the retaining unit (2).

Description

technical field [0001] The present invention relates to a jig for holding a cover provided in a processing chamber for processing a substrate to be processed. Background technique [0002] Etching treatment, ashing treatment, or CVD (Chemical Vapor Deposition: Chemical Vapor Deposition: Chemical Vapor Deposition) A substrate processing apparatus for film-forming processes such as deposition) has a processing chamber for performing these processes. The processing chamber is a processing container for performing various processing on the substrates by supplying activated processing gas to the substrates under a vacuum atmosphere or the like. [0003] An example of a processing chamber in which a substrate is etched is provided. Inside the processing chamber is provided with: a mounting table on which the substrate is placed and constitutes a lower electrode; Etching gas, etc., and constitute the gas shower head of the upper electrode, etc. Then, by applying high-frequency p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00
CPCH01L21/67167H01L21/6719
Inventor 田中善嗣羽鸟一成笠原稔大
Owner TOKYO ELECTRON LTD
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