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Anti-corrosive photoresist-removing agent composition

A photoresist, anti-corrosion technology, applied in the direction of optics, photomechanical equipment, photosensitive material processing, etc., can solve the problem that the anti-corrosion effect of copper has not been confirmed, the stripping agent composition has not been disclosed in detail, and there is no aromatic hydroxyl group Compound records and other issues, to achieve the effect of excellent anti-corrosion effect

Active Publication Date: 2014-03-05
SHANDONG QINGYUN CHANGXIN CHEM SCI TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, although the anti-corrosion effect on aluminum was confirmed, the anti-corrosion effect on copper was not confirmed
[0006] Patent Document 2 describes the use of sugars (linear polyols) or aromatic hydroxy compounds as corrosion inhibitors, but the examples and the like do not specifically disclose the stripping liquid composition using aromatic hydroxy compounds and sugars in combination
[0007] In addition, although Patent Document 3 discloses a stripping liquid composition containing sugars, there is no description about the use of aromatic hydroxy compounds.
[0008] In addition, although Patent Document 7 has a non-aqueous cleaning composition containing a polar organic solvent and an organic hydroxylated amine compound, etc., about sugars or aryl compounds in which two or more hydroxyl groups are directly bonded to an aromatic ring, etc. It is described, but the peeling agent composition using aromatic hydroxy compound and sugar in combination is not specifically disclosed in the examples, etc.

Method used

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  • Anti-corrosive photoresist-removing agent composition
  • Anti-corrosive photoresist-removing agent composition
  • Anti-corrosive photoresist-removing agent composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0083] Using 86.5% by mass of 3-methoxy-N,N-dimethylpropanamide and 12.5% ​​by mass of N-MeEtAm as a base, add 0.5% by mass of hydroquinone and 0.5% by mass of xylitol The anticorrosion agent 1.0% by mass is used to prepare an anticorrosion photoresist stripper composition. The mixing ratio is shown in Table 1. Moreover, about the obtained anticorrosion photoresist stripper composition, the corrosion rate of copper and aluminum, water concentration dependence, and temperature dependence were evaluated by the procedure shown below.

[0084] (Evaluation of corrosion rate)

[0085] Al and Cu (approximately 7000 ?) were vapor-deposited on a glass plate to prepare two kinds of test pieces. The anticorrosion photoresist stripper composition obtained above was maintained at 60° C., and two types of test pieces were immersed for 33 minutes. After immersion, the test piece was thoroughly washed with isopropanol, then air-dried, and the surface resistance was measured by the four-pro...

Embodiment 2

[0091] Except having used the composition ratio shown in Table 1, the photoresist stripper composition was prepared similarly to Example 1, and the corrosion rate and water concentration dependence were evaluated. Table 2 shows the evaluation results of the corrosion rate of Cu, and Table 3 shows the evaluation results of the corrosion rate of Al.

Embodiment 3 and 4

[0108] Except having adopted the compounding ratio shown in Table 5, it carried out similarly to Example 1, and prepared the anticorrosion photoresist stripper composition, and evaluated the corrosion rate. The evaluation results are shown in Table 5.

[0109] [table 5]

[0110]

[0111] Based on Examples 3 and 4, it was investigated whether the anticorrosion effect caused by the use of anticorrosion agents was different due to the difference in amines. In Example 3, monoethanolamine was mixed with 3-methoxy-N,N-dimethylpropionamide, and in Example 4, tertiary alkanolamine DMAE was mixed, and the evaluation results of the corrosion rate shown in Table 5 were obtained. . From these results, it can be seen that the effect of using the two anticorrosive agents in combination is greater in the system containing a secondary amine or tertiary amine than in the case of containing a primary amine.

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Abstract

An anti-corrosive photoresist-removing agent composition, which contains a polar organic solvent (A), an organic amine compound (B) and an anti-corrosive agent (C) which is composed of a combination of an aromatic polyhydroxy compound and a saccharide.  The anti-corrosive photoresist-removing agent composition exhibits an excellent anti-corrosive effect on both copper and aluminum over a wide temperature range in the presence or absence of water.

Description

technical field [0001] The present invention relates to an anticorrosion photoresist stripper composition, and particularly provides an anticorrosion photoresist stripper composition excellent in an anticorrosion effect by containing a specific anticorrosion agent. Background technique [0002] Conventionally, various strippers have been developed for the purpose of easily stripping a resist coated on an inorganic substrate. [0003] From the viewpoint of producing high-precision circuit wiring, these strippers are required to be able to strip the resist without corroding aluminum or copper used as metal wiring or an inorganic substrate during stripping. In order to meet these requirements, methods of adding carboxylic acids such as benzoic acid and acetic acid, chelates, sugars such as sorbitol, and polyhydroxy aromatics such as catechol as anticorrosion agents have been studied. [0004] In addition, aluminum wiring is often used in liquid crystal displays, but with the i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
CPCG03F7/425
Inventor 山崎勇人藤冈东洋藏
Owner SHANDONG QINGYUN CHANGXIN CHEM SCI TECH