Method for manufacturing tungsten target material
A production method and target technology, which are applied in the field of tungsten target production, can solve the problems of expensive molds, easy wear and tear, and the uniformity of the internal structure of tungsten targets cannot meet the requirements of increasingly high sputtering processes. Excellent uniformity
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[0026] As described in the background art, the uniformity of the internal structure of the tungsten target processed by the existing hot pressing process cannot meet the increasingly demanding sputtering process. The inventor analyzes that this is because the hot pressing is performed on a single axis. Pressure is applied in a direction (for example, a vertical direction), which makes the powder grains receive uneven force in all directions when they are formed into a target material. Therefore, the inventor proposes to adopt the hot isostatic pressing method in the sintering molding process. Specifically, the manufacturing method of the tungsten target material provided by the present invention includes: firstly, the tungsten powder is sealed by a vacuum sheath; then the hot isostatic pressing process is used for sintering molding; after the sintering molding is completed, cooling and removing the vacuum sheath to take out the tungsten target In the process of forming the tung...
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