Workbench position measuring system

A measurement system and workbench technology, applied in the field of measurement systems, can solve problems such as low integration and complex layout of interferometer measurement systems

Inactive Publication Date: 2012-03-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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Problems solved by technology

[0003] The purpose of the present invention is to provide a worktable position measurement system in a lithography machin

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[0015] The specific implementation manners of the present invention will be described in further detail below with reference to the accompanying drawings. Throughout the description, like reference numerals refer to like parts.

[0016] The workbench position measurement system composed of two-dimensional grating ruler and multiple rows of reading heads can measure the movement of the workbench stably, effectively and with high precision. The workbench position measurement system has a high degree of integration, is relatively independent and complete, and is subject to other subsystems. The influence of repair and maintenance is small. In addition, the structure and layout of the measurement system are simpler than those of the laser interferometer measurement system, and the requirements for design adjustment are also lower.

[0017] The method for measuring the movement information of the wafer carrier of the lithography machine can monitor the environmental impact in real ...

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Abstract

The invention provides a workbench position measuring system. The workbench position measuring system comprises a lens, a main base plate, a wafer supporting stage, a marble, one or more grating ruler groups and one or more read head groups corresponding to the one or more grating ruler groups. The lens is fixed on the main base plate. The one or more read head groups form a read head set. The read head set is installed on the main base plate. The one or more grating ruler groups are fixed around the wafer supporting stage. The wafer supporting stage is installed on the marble and moves on the surface of the marble. The one or more read head groups can read motion information through relative motion between the one or more read head groups and the one or more grating ruler groups. Readings of the read head set is collected through the lens so that motion information of the wafer supporting stage on the surface of the marble is obtained. The workbench position measuring system can stably, effectively and accurately measure workbench motion. The workbench position measuring system has a high integrated level, is relatively independent and complete, and is subjected to a small influence from maintenance of other subsystems.

Description

technical field [0001] The invention relates to a measurement system in a lithography machine, in particular to a horizontal position measurement system of a workbench in a lithography machine. Background technique [0002] At present, the common lithography machines on the market all use the interferometer measurement system to measure the horizontal position of the working platform. The interferometer measurement system is widely used in the position measurement of the workbench due to its advantages of large measurement range and high precision. However, the interferometer measurement system has high requirements on the environment, and it is necessary to correctly measure the environmental parameters, such as air pressure, temperature, humidity, etc., and continuously compensate the interferometer. This results in a change in the laser wavelength, which will result in a position change of 50 nm over a measurement length of 500 mm. Laser alignment errors vary over time,...

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Application Information

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IPC IPC(8): G03F7/20G01B11/00G01B11/26
Inventor 齐芊枫郑椰琴吴立伟
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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