Patterning device for generating a pattern in and/or on a layer
A technology of equipment and composition, applied in welding equipment, opto-mechanical equipment, laser welding equipment, etc., can solve the problem of pattern taking too long, and achieve the effect of reducing composition time, increasing cost and reducing time
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[0044] figure 1 A schematic cross-sectional view of a patterning device 10 according to the invention is shown for producing patterns 20 , 22 , 24 (see FIGS. 4 and 5 ) in and / or on layers 32 , 34 (see FIGS. 4 and 6 ). The patterning apparatus 10 comprises a light source 50 for generating a converging light beam 40 and comprises scanning means 70, eg a movable mirror 70 or a movable exposure chuck 72 on which a substrate comprising layers 32, 34 may be arranged. The patterning device 10 also comprises a diffractive optical element 60 for splitting the concentrated light beam 40 into a plurality of converging beamlets 40A, 40B, 40C. Via a diffractive optical element 60 , the single converging beam 40 is split into a plurality of converging beamlets 40A, 40B, 40C, so that the multiple converging beamlets can be used to generate the patterns 20 , 22 , 24 . In this way, especially when a relatively large area of the pattern 20, 22, 24 comprising areas of substantially equal gray...
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