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Cyclic system and method

A circulation system and circulation loop technology, applied in the field of circulation system, can solve problems such as particle solution pollution, insufficient uniformity of grinding slurry, and blockage

Active Publication Date: 2014-08-27
ASIA MIC PROCESS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Due to the above-mentioned problems in the prior art, the object of the present invention is to provide a circulation system and method to solve the problem that the particle solution is polluted by the particles of the pressurized pump, or the bearing of the pressurized pump is polluted by the abrasive particles in the grinding slurry. Blockage, or insufficient uniformity of the abrasive slurry in the delivery pipeline

Method used

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Embodiment Construction

[0017] The present invention will be further described below according to accompanying drawing and specific embodiment:

[0018] In the first embodiment of the circulation system of the present invention, the circulation system includes a pressure vessel, a first circulation loop, a valve body set, a pump and a second circulation loop.

[0019] In the present invention, the particle solution can be stored in the pressure vessel, and has a pressurized air inlet, a circulation outlet and multiple circulation inlets. And the pressure vessel is a cylindrical groove, the top and bottom of the cylindrical groove are arc-shaped, and then form an arc top and an arc bottom, the pressurized air inlet is arranged on the arc top, and a plurality of The circulation entrance is set at the bottom of the arc. The pressurized gas inlet can be used to receive high-pressure gas to increase the pressure in the pressure vessel. There is a first node and a second node on the first circulation loo...

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Abstract

The invention discloses a cyclic system and method. The cyclic system utilizes a first cyclic loop to connect the outlet of a pressure container, a pump, and a valve set, with the valve set being connected with the inlet of the pressure container, thereby making the grain solution flow between the first cyclic loop, the valve set, and the pressure container via a cyclic pump to realize the objective of stirring the grain solution inside the pressure container. A second cyclic loop is connected with the outlet of the pressure container, multiple first magnetic suspension pumps, a second magnetic suspension pump, and a valve set, with the purpose of conveying the grain solution to a machine tool. The second magnetic suspension pump conveys the grain solution to the inlet of the pressure container via the valve set at the end of the second cyclic loop, thereby realizing the purpose of conveying the grain solution in a cyclic manner.

Description

technical field [0001] The present invention relates to a circulation system and method, more specifically to a system and method for circulating a particle solution in a pressure vessel using a maglev pump. Background technique [0002] Affected by the high density of semiconductor devices and the circuit distribution of multi-layer structures, more and more attention has been paid to the wafer surface planarization process. For planarization, chemical mechanical polishing (CMP) is usually used. In the general CMP process, a pressurized pump is usually used to drive the grinding slurry, but the bearing of the pressurized pump may be worn during the pressurization process, which will cause many particles to contaminate the grinding slurry, or the pressurized pump may Pu's bearings are clogged with abrasive particles in the abrasive slurry and cannot function properly. And in the general CMP process, if the grinding slurry in the pressurized storage tank is not continuously...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24B57/00
Inventor 徐宏信
Owner ASIA MIC PROCESS
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