Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Riveted resistance element

A resistance element and riveting technology, applied in the field of resistance elements, can solve the problems such as easy falling off of edging, difficult control of production process, and inability to be used in high-voltage fields, etc., to achieve the effect of saving edging materials

Inactive Publication Date: 2012-05-30
SHANGHAI GINO TELEMA RESISTORS
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] 1) The metal edging has a floating potential, which cannot be used in high-voltage fields;
[0007] 2) The production process is difficult to control, and the edge wrapping is easy to fall off

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Riveted resistance element
  • Riveted resistance element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0022] Such as figure 1 As shown, a riveting resistance element includes a resistance element body 1, a first wrapping 3, and a second wrapping 2, the first wrapping 3 is wrapped outside the resistance element body 1, and the second wrapping 2 is wrapped on the outside of the first hemming 3. The first wrapping 3 is mica wrapping. The second edging 2 is metal edging. The first wrapping 3 , the second wrapping 2 , and the resistance element main body 1 are fixedly connected by rivets 4 . The rivet 4 is a blind rivet.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a riveted resistance element, comprising a resistance element body, a first bound edge and a second bound edge. The first bound edge is outside the resistance element body; and the second bound edge is outside the first bound edge. Compared with a prior art, the invention has advantages of reducing creepage distance, saving bound edge material, avoiding suspension potential and unsusceptibility to shedding of the bound edge, etc.

Description

technical field [0001] The invention relates to a resistance element, in particular to a riveted resistance element. Background technique [0002] In the application field of high-power resistors, metal chip resistor elements are widely used for their characteristics such as large resistance range, small size, convenient installation, and small maintenance workload. [0003] The resistance element is generally cut and punched into a sheet-like entity, that is, a resistance element, by cutting and punching a metal material. Combining these resistance elements in series or in parallel can obtain the desired resistance value. [0004] After being punched or cut, the resistance element is divided into several strip-shaped connecting bodies, which are similar to spring bodies and can be freely expanded and contracted. It is not easy to fix and further assemble and install. Therefore, these strip-shaped connecting strips need to be fixed. Fixing with hemming strips is a reliable ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01C3/00
Inventor 黄秀菊王艳
Owner SHANGHAI GINO TELEMA RESISTORS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com