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Manufacturing method for electrochromic device and electrochromic device

A technology of electrochromic device and manufacturing method, which is applied in the directions of instruments, nonlinear optics, optics, etc., can solve the problems of poor generality of the manufacturing method, unsuitable for mass production, and high manufacturing cost, so as to reduce the manufacturing cost and improve the versatility. , Guaranteed quality effect

Active Publication Date: 2014-06-11
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, from the current point of view, most electrochromic devices are still in the research and development stage of the laboratory. Due to the constraints of laboratory conditions, their production methods have poor versatility, cannot be compatible with related processes, and have high production costs. mass production

Method used

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  • Manufacturing method for electrochromic device and electrochromic device
  • Manufacturing method for electrochromic device and electrochromic device
  • Manufacturing method for electrochromic device and electrochromic device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Such as image 3 As shown, this embodiment includes the following steps:

[0037] Step 201, providing a glass substrate formed with a first transparent conductive layer (first substrate formed with a first transparent conductive layer), and cleaning the glass substrate;

[0038] Step 202 , at a predetermined position on the glass substrate, a frame-sealing glue partition wall is formed by screen printing or a spreading process, and the frame-sealing glue partition wall is cured.

[0039] The frame sealing glue partition wall is a continuous partition wall, and the area surrounded by the frame sealing glue partition wall is the electrochromic region of the electrochromic device. In the subsequent steps, this region will form a cathode color-changing layer and an anode layer. For the electrochromic layer, since the instilled frame sealant includes components such as epoxy resin, catalyst and solution, in this step, the frame sealant partition wall is cured to prevent the...

Embodiment 2

[0051] The difference between the preparation method of this embodiment and the first embodiment lies in that the separation wall formed is different, such as Figure 4 As shown, this embodiment includes:

[0052] Step 301, providing a glass substrate formed with a first transparent conductive layer (first substrate formed with a first transparent conductive layer), and cleaning the glass substrate;

[0053] Step 302 , forming a photoresist isolation wall or a non-metal insulating isolation wall at a preset position on the glass substrate, and the area surrounded by the formed isolation wall is the electrochromic area of ​​the electrochromic device.

[0054] When the isolation wall is a photoresist isolation wall, this step includes:

[0055] Coating photoresist on the glass substrate, exposing and developing through a mask plate, forming a photoresist isolation wall at a preset position on the glass substrate, and curing the formed photoresist isolation wall to prevent the i...

Embodiment 3

[0065] The preparation method of this embodiment, such as Figure 5 shown, including:

[0066] Step 401, providing a glass substrate formed with a first transparent conductive layer (first substrate formed with a first transparent conductive layer), and cleaning the glass substrate;

[0067] Step 402 , forming a photoresist isolation wall or a non-metal insulating isolation wall at a predetermined position on the glass substrate, and the area surrounded by the formed isolation wall is the electrochromic area of ​​the electrochromic device.

[0068] Wherein, the partition wall is at least two partition walls arranged parallel to each other with discontinuities, and the at least two partition walls are complementary to each other, which can also achieve the effect of isolation and blocking.

[0069] Step 403 , forming a cathodic color-changing layer of the electrochromic layer on the glass substrate formed with the photoresist isolation wall or the non-metal insulating isolatio...

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Abstract

The embodiment of the invention discloses a manufacturing method for an electrochromic device and the electrochromic device, relates to the technical field of display, and aims to improve the universality of the manufacturing method. The manufacturing method for the electrochromic device comprises the following steps of: forming a separation wall on a first substrate on which a first transparent conductive layer is formed, wherein the separation wall is formed around an electrochromic region; forming an electrochromic layer on the electrochromic region of the first substrate, on which the separation wall is formed, wherein the electrochromic layer comprises a cathodochromic layer and an anode layer; and folding the first substrate on which the electrochromic layer is formed and a second substrate on which a second transparent conductive layer is formed. The manufacturing method can be used for manufacturing of the electrochromic device.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing an electrochromic device and the electrochromic device. Background technique [0002] Electrochromism (Eletrochromism, EC) refers to the phenomenon that the optical properties of materials undergo stable and reversible color changes under the action of an external electric field. A special phenomenon of changes in the physical properties of materials caused by electrochemical changes that produce reversible changes. In appearance, it is manifested as reversible changes that are displayed as color and transparent. [0003] Generally, materials with electrochromic properties are called electrochromic materials, and devices made of electrochromic materials are called electrochromic devices. Such as figure 1 As shown, the structure of a typical electrochromic device includes a cathodic color changing layer and an anode layer, and the cathodic color chang...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/161G02F1/153
Inventor 李文波张卓王刚
Owner BOE TECH GRP CO LTD
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