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Exhaust system of light source unit and photoetching machine

A technology of light source unit and lithography machine, which is applied to microlithography exposure equipment, photolithography process exposure device, cooling/heating device of lighting device, etc. Solving problems such as machine downtime, to protect the lithography machine, improve production efficiency, and avoid downtime

Inactive Publication Date: 2012-07-04
ADVANCED SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to various reasons, the exhaust air supplied by the factory exhaust unit 105 is unstable and less than the standard value, which often causes the light source unit 101 to be turned off abnormally, causing the lithography machine to stop (i.e. shutdown), seriously affecting production efficiency

Method used

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  • Exhaust system of light source unit and photoetching machine
  • Exhaust system of light source unit and photoetching machine
  • Exhaust system of light source unit and photoetching machine

Examples

Experimental program
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Effect test

Embodiment 1

[0029] see figure 2 The exhaust system of the light source unit provided in this embodiment includes an exhaust pipe 204. One end of the exhaust pipe 204 is connected to the light source unit 201, and the other end is externally connected to the factory exhaust unit 205. The exhaust system of the light source unit It also includes a blower 207, the blower 207 is arranged on the exhaust pipe 204, and the light source unit 201 is a mercury lamp unit. By adding a blower 207 to the exhaust pipe 204, the stable and effective exhaust of the light source unit 201 can be realized, and the light source unit 201 can be prevented from being turned off abnormally because the heat cannot be discharged in time, thereby prolonging the service life of the light source unit 201.

[0030] Preferably, in the exhaust system of the light source unit in this embodiment, the air blower 207 is a low-pressure air blower with a pressure range of 100Pa-200Pa. Many experiments have shown that the air b...

Embodiment 2

[0034] see image 3 The lithography machine provided in this embodiment is a stepper lithography machine, including a light source unit 201, an optical path transmission system 202, an exposure system 203, and an exhaust system of the light source unit, and the light emitted by the light source unit 201 is transmitted through the optical path The system 202 is transferred to the exposure system 203 for exposing a substrate (not shown). Wherein, the exhaust system of the light source unit includes an exhaust pipe 204 and a blower 207, one end of the exhaust pipe 204 is connected to the light source unit 201, and the other end of the exhaust pipe 204 is externally connected to the factory exhaust unit 205 , the blower 207 is arranged on the exhaust pipe 204 , and the light source unit 201 and the exposure system are arranged on the floor 206 . In the photolithography machine of this embodiment, the light source unit 201 is a mercury lamp unit. By adding a blower 207 to the exh...

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PUM

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Abstract

The invention discloses an exhaust system of a light source unit. The exhaust system comprises an exhaust pipe and an air blower, wherein one end of the exhaust pipe is connected with the light source unit, and the other end of the exhaust pipe is externally connected with a factory-affair exhaust unit; and the air blower is arranged on the exhaust pipe. The invention also discloses a photoetching machine. The photoetching machine comprises the light source unit, an optical path transmission system, an exposure system and the exhaust system of the light source unit, wherein the light emitted by the light source unit is transmitted to the exposure system through the optical path transmission system; and the exhaust system of the light source unit comprises the exhaust pipe and the air blower, one end of the exhaust pipe is connected with the light source unit, the other end of the exhaust pipe is externally connected with the factory-affair exhaust unit, and the air blower is arranged on the exhaust pipe. The air blower is additionally arranged on the exhaust pipe, so that the light source unit can be stably and effectively exhausted to prevent the light source unit from abnormal blackout because the heat cannot be exhausted in time, thus the light source unit is protected, and simultaneously the photoetching machine can be prevented from shutdown because of the abnormal blackout of the light source unit.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to an exhaust system of a light source unit and a photolithography machine. Background technique [0002] At present, when manufacturing devices such as semiconductor devices and flat panel displays, a photolithography machine is usually used to pattern a substrate. The photolithography process mainly includes the steps of coating photoresist on the substrate, exposing the photoresist coated on the substrate, and developing the exposed substrate. [0003] see figure 1 , figure 1 Shown is a schematic structural diagram of an existing lithography machine, which mainly includes a light source unit 101, an optical transmission system 102, and an exposure system 103. The light emitted by the light source unit 101 is transmitted to the exposure system 103 through the optical transmission system 102, The light source unit 101 and the exposure system are disposed on the floor 1...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20F21V29/02F21V29/67
Inventor 陈艳艳王剑锋王琳
Owner ADVANCED SEMICON MFG CO LTD