Adjustable capacitor, plasma impedance matching device, plasma impedance matching method, and substrate treating apparatus
A technology for substrate processing and impedance matching, which is applied in the direction of plasma, multi-connected capacitors, capacitors that change the distance between electrodes, etc., and can solve problems such as difficult impedance matching
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[0055]The present invention is further fully described below with reference to the accompanying drawings showing embodiments of the invention. However, this invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. In this application, the same reference numerals refer to the same elements
[0056] It will be understood that although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, Layers and / or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or se...
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