Inductive coupling plasma device
A plasma and inductive coupling technology, applied in the direction of plasma, electrical components, etc., can solve the problem that the plasma distribution has no adjustment effect, and achieve the effect of flexible density distribution, elimination of differences in results, and adjustment of density distribution.
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 The specific implementation manners of the present invention will be described in detail below in conjunction with the accompanying drawings.
 In the present invention, the inductively coupled plasma device is provided with a compensation adjustment device capable of compensating the influence of the geomagnetic field and adjusting the plasma density distribution, and the compensation adjustment device is arranged outside or inside the inductive coupling generating device.
 Wherein, the inductively coupled plasma device at least includes: a radio frequency main power supply 10 providing radio frequency current, the inductively coupled generating device, a plasma working chamber 19, and an An adjustment bracket 17 for adjusting the height of the plasma working chamber 19.
 The inductive coupling generating device is composed of an inductance coil 22, a quartz dielectric window 18 and a shielding coil box 12 for shielding electromagnetic radiation ...
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