Release film with high anti-static property and method for manufacturing the same

A manufacturing method and release film technology, applied in the direction of static electricity, chemical instruments and methods, electrical components, etc., can solve the problem of poor antistatic performance, unsuitability, release force and residual adhesive rate and other release characteristics degradation and other problems, to achieve the effect of good release characteristics and excellent anti-static performance

Inactive Publication Date: 2012-07-18
YOULCHON CHEM
View PDF6 Cites 34 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Therefore, the technology of adding an antistatic substance to the release layer of the release film was originally tried, but in this case, the release characteristics such as the rel

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Release film with high anti-static property and method for manufacturing the same
  • Release film with high anti-static property and method for manufacturing the same
  • Release film with high anti-static property and method for manufacturing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] A silicone release layer is formed on one side of the polyethylene terephthalate (PET) film, and an antistatic layer is formed on the other side, such as figure 1 As shown, a release film test piece with a three-layer structure was produced. The weight proportion of above-mentioned organosilicon release layer accounts for 10 parts according to the weight of organopolysiloxane, the weight of hydrogen-containing organopolysiloxane accounts for 0.01 part, the weight of platinum chelate accounts for 0.1 part, and solvent (toluene ) constitutes 100 parts by weight.

[0052] And, the weight proportion of the antistatic mixture of above-mentioned antistatic layer is, as the weight of the acryloyl chloride resin of adhesive agent 15 parts, the weight of polyethylenedioxythiophene (PEDOT) as antistatic agent 10 parts, ethanol (common 30 parts by weight of alcohol) and 45 parts by weight of water, the antistatic mixture is coated on a polyethylene terephthalate (PET) film to for...

Embodiment 2

[0054] Same as above-mentioned embodiment 1, antistatic layer is placed between polyethylene terephthalate (PET) film and organic silicon release layer, has figure 2 3-layer construction shown. Specifically, the same antistatic mixture as in Example 1 was coated on a polyethylene terephthalate (PET) film to form an antistatic layer, and then a silicone release layer was formed on the antistatic layer.

Embodiment 3

[0056] Compared with above-mentioned embodiment 1, antistatic layer is formed on both sides of polyethylene terephthalate (PET) film, as image 3 As shown, it has a 4-layer structure. Specifically, an antistatic compound is coated on both sides of a polyethylene terephthalate (PET) film to form a two-layer antistatic layer, and then a silicone release layer is formed on one side. At this time, the same antistatic mixture as in the above-mentioned examples was used for the two antistatic layers.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Surface resistanceaaaaaaaaaa
Login to view more

Abstract

The invention relates to a release film with a base film and a release film. The release film of an anti-static layer including binder and anti-static agent and the manufacturing method thereof are provided. The release film possesses excellent release force and, remaining binder ratio and other release characteristics, the anti-static performance is excellent, and the release can be effectively applied in products in IT field.

Description

technical field [0001] The present invention relates to a release film with excellent antistatic performance and a manufacturing method thereof, more specifically, a release film with good release characteristics and excellent antistatic performance and a manufacturing method thereof. Background technique [0002] Generally speaking, the main purpose of the release film is to protect the adhesive layer (or adhesive layer). Release films are generally used in industrial adhesive tapes (or adhesive tapes), etc. In recent years, applications in IT fields such as mobile phones, LCDs, semiconductors, and displays have increased rapidly. [0003] The release film includes a base film and a release layer. The base film is mostly made of paper or plastic film, and the release layer is mainly composed of silicon mixture. The release film is required to have release characteristics such as release force and residual adhesive rate. Specifically, while the adhesive (adhesive) layer i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B32B27/06B32B33/00B32B37/15
CPCC09D183/06C08J7/044H05F1/00
Inventor 皇甫绤金义城裴钟佑
Owner YOULCHON CHEM
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap