Inserted low temperature condensing plate device

Abstract

The invention relates to a low temperature condensing plate device. The low temperature condensing plate device comprises low temperature condensing plates (3), wherein a shielding plate (2) formed by connecting a lower bottom plate and a side panel is arranged around the low temperature condensing plates (3). A baffle (1) is arranged at the top of the shielding plate (2). The lower bottom plate of the shielding plate (2) is connected with a primary cold head of a refrigerator (6). Two sets of low temperature condensing plates (3) with holes are respectively connected with secondary cold heads of two double secondary refrigerators (6). The refrigerators (6) are fixed on an installation flange (4). A low temperature condensing device is arranged in a vacuum room through the installation flange (4). Therefore, the low temperature condensing plate device overcomes the problem that gas extraction speed is limited by the diameter of a pump opening of a low temperature pump and the baffle in conventional low temperature pump, and can obtain clean ultrahigh vacuum of 5E-6Pa by condensing gas on the low temperature surface and extracting the gas. When the low temperature condensing plate device is coated with active carbon, the volume of nitrogen can be remarkably increased. The low temperature condensing plate device can remarkably improve the extraction speed of nitrogen when the low temperature condensing plate device serves as a built-in pump.

Description

technical field [0001] The invention relates to a plug-in low-temperature condensation plate device, and relates to the technical field of obtaining ultra-high vacuum by condensing and capturing gas through the low-temperature condensation plate placed inside a vacuum chamber, and in particular to the structure of the low-temperature condensation plate in the plug-in low-temperature condensation plate device And the required shielding plate, baffle and connection structure with the cold head of the refrigerator. Background technique [0002] In recent years, the compact cyclotron technology has developed rapidly. Due to the limitation of compact structure size, the space available for vacuum pumping is limited, and the beam loss of particles during acceleration is required to be controlled within a certain range. The ultimate vacuum requirement is high, so high pumping speed, low ultimate pressure, and compact vacuum system are the key technical problems that more and more ...

AI Technical Summary

Problems solved by technology

But still like other types of vacuum pumps, it needs to be installed outside the pumped device to pump air, and the pumping speed of the pump is limited by the conductance of the pump port.

For compact cyclotrons with special-shaped and large-volume devices, it is difficult to achieve the required ultra-high vacuum by pumping air from the outside. At present, there is no effective vacuum pump on the market that can meet the requirements of compact cyclotrons with special-shaped and large-volume devices. Vacuum requirements

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