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ion implanter

An ion implantation device and ion beam technology, which are applied in ion implantation plating, coating, electrical components and other directions, can solve the problem of increasing power consumption of mass separation magnets, and achieve small size, uniform magnetic field distribution, and low power consumption. Effect

Active Publication Date: 2015-08-26
NISSIN ION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this case, the power consumption of the mass separation magnet increases as the amount of current increases.

Method used

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Examples

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Embodiment Construction

[0046] exist figure 1 of (A), figure 1 (B) shows an example of the ion beam 1 used in the present invention. These ion beams 1 indicate that the figure 2 of (A), figure 2 The appearance of the ion beam 1 flying on the beam path between the ion source 1 and the mass separation magnet 3 described in (B). The ion beam 1 is generated by an ion source 2 described below, travels in the illustrated Z-axis direction (also referred to as the Z direction or the traveling direction of the ion beam 1 in the present invention), and enters a mass separation magnet 3 described below.

[0047] in use with figure 1 Cut in a plane perpendicular to the direction of travel of the ion beam 1 described in (A) figure 1 For ion beam 1 described in (A), figure 1 The ion beam 1 recorded in (A) has a length of width WX along the X-axis direction (also referred to as the X direction or the length direction of the ion beam 1 in the present invention), and has a length of width WX along the Y-ax...

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Abstract

The invention provides an ion implantation device, comprising a quality separating magnet. Even on the condition that along with the large-scale substrate size, the size of a strip-like ion beam in the length direction is increased, compared with the prior art, the electricity consumption of the quality separating magnet is small, the magnetic field distribution between magnetic poles is uniform and the size is small. The ion implantation device comprises an ion source for generating the strip-like ion beam; the quality separating magnet possessing a pair of magnetic poles which are arranged oppositely across the main plane of the ion beam, and enabling the traveling direction of the ion beam in the length direction of the ion beam to be deflected via the magnetic field generated between the magnetic poles; an analysis slit enabling the ion beam including the hoped ion types to pass; a processing chamber equipped with a substrate and enabling the ion beam passed the analysis slit to be irradiate to the substrate. The direction of the magnetic field generated between the magnetic poles aslant crosses the main plane of the ion beam in the interior of the quality separating magnet.

Description

technical field [0001] The invention relates to an ion implantation device for performing mass separation on a ribbon-shaped ion beam and performing ion implantation treatment on a substrate. Background technique [0002] Conventionally, an ion implanter that performs mass separation on a ribbon ion beam and performs ion implantation on a substrate has been used. An example of such an ion implantation apparatus is disclosed in Patent Document 1. [0003] The mass separation magnet used in the ion implantation apparatus of Patent Document 1 includes a pair of magnetic poles disposed opposite to each other so as to sandwich the ribbon-shaped ion beam in the longitudinal direction of the ribbon-shaped (or called sheet-shaped) ion beam. , the ribbon ion beam is long in one direction and has a thickness in a direction perpendicular to the length direction. A coil is wound around each magnetic pole, and a magnetic field is generated between the magnetic poles by supplying a curr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/317H01J37/304
CPCC23C14/48H01J37/026H01J37/08H01J37/14H01J37/252H01J37/3171H01J37/3266
Inventor 内藤胜男土肥正二郎
Owner NISSIN ION EQUIP CO LTD