Full-strain measurement type in-situ nanometer impress/scratch testing device

Abstract

The invention relates to a full-strain measurement type in-situ nanometer impress / scratch testing device, belonging to the field of an electric integrated precise scientific instrument. The full-strain measurement type in-situ nanometer impress / scratch testing device comprises a macro-adjustment mechanism, a precise pressing unit, a load and displacement signal detecting unit, and a scratch driving unit; the macro-adjustment mechanism is mounted on a base; the precise pressing unit is connected with an x direction sliding table of the macro-adjustment mechanism through a transition connection board; the load and displacement signal detecting unit comprises two groups of eight strain sheets; the strain sheets are respectively mounted on a flexible hinge and an x direction flexible hinge for detecting a load of the precise pressing unit in an embedded manner; and the scratch driving unit is connected with the base through a screw. Signal detection is carried out by using the internal strain sheets, so that the entire testing device has the advantages of compact structure and small size; and the entire testing device is conveniently mounted on carrier tables, such as a scanning electron microscope (SEM) or an X-ray diffraction meter, so that the in-situ impress and scratch test of the material can be realized. Therefore, the full-strain measurement type in-situ nanometer impress / scratch testing device provides technical support for researching a damage mechanism of the material.

Description

technical field [0001] The invention relates to the field of precision scientific instruments of electromechanical integration, in particular to a miniaturized full-strain measurement type in-situ nano-pressure / scratch testing device which integrates precision driving, detection and in-situ testing. Background technique [0002] In-situ nano-indentation / scratch testing technology is an international cutting-edge technology developed in recent years. Once proposed, it has been highly valued by governments and research institutions of various countries. Related research results have been published by top journals such as "Nature" and "Science". reports. The work done by Swiss Federal Institute of Technology and Hysitron of the United States on in-situ indentation testing is the most representative. At present, Hysitron has launched a commercial in-situ nano-indentation instrument, but the high price has seriously hindered the development of this product. Widely promoted a...

AI Technical Summary

Problems solved by technology

Miniaturization puts forward requirements for the drive and detection unit of the test device. The drive and detection unit that can be used in many off-site nanopressure / scratch test devices cannot realize the miniaturization of the device due to their large size, so a novel drive is required. and detection methods as well as ingenious structural design to develop compact test devices

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