Preparation method of i-iii-vi material double-junction thin-film solar cell
A thin-film solar cell, I-III-VI technology, applied in circuits, electrical components, final product manufacturing, etc., can solve the problems of complex battery structure, increase battery cost, poor process compatibility, etc., to simplify battery structure, simplify Production process, the effect of solving the phenomenon of reverse junction
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[0027] In order to further disclose the invention content, features and effects of the present invention, the following examples are specifically cited and described in detail in conjunction with the accompanying drawings as follows.
[0028] The preparation process of the I-III-VI group material double-junction thin film solar cell of the present invention:
[0029] Step 1: Prepare the back electrode Mo on the substrate by DC magnetron sputtering:
[0030] (1) At room temperature, first use a background vacuum of -3 Pa, the working pressure is high pressure of 1-2Pa, and the sputtering power is low power of 60W. Mo is deposited on the flexible polyimide substrate by DC magnetron sputtering. The deposition time is 60min, and the first layer is formed on the substrate. Mo film with a thickness of 0.05-0.1 μm;
[0031] (2) The background vacuum is -3 Pa, the working pressure is low pressure of 0.2-0.4Pa, and the sputtering power is high power of 150W. Mo is deposited on the fir...
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