Ultralow-distortion and dodging digital projection optical system for DMD

Abstract

The invention discloses an ultralow-distortion and dodging digital projection optical system for a DMD (Digital Micromirror Device), which comprises a light source, a dodging shaping system, a digital micromirror and a projection objective system, wherein the dodging shaping system comprises a light guide rod, a beam expanding lens system and a mirror system; the light source, the light guide rod and the beam expanding lens system are sequentially arranged on a first optical axis; the digital micromirror and the projection objective system are sequentially arranged on a second optical axis positioned at one end of the beam expanding lens system; the first optical axis forms an included angle with the second optical axis; a beam emitted by the light source passes through the light guide rod and the beam expanding lens system and then is reflected by the mirror system to the digital micromirror; and the digital micromirror images the reflected beam through the projection objective system. The system has the advantages of higher illumination uniformity and precision, ultralow distortion and low cost.

Description

technical field [0001] The present invention relates to the field of optoelectronic technology, and more specifically relates to an ultra-low distortion uniform light DMD digital projection optical system suitable for digital light processing and requiring high etching precision or imaging precision. Background technique [0002] In some high-precision lithography or imaging systems, an illumination system with high uniformity and an ultra-low distortion projection system are required; in actual industrial production, in order to simplify the production process and reduce production costs, a maskless projection is being sought Technology to save the production cost of the mask plate. However, the optical system of projection lithography in the prior art generally has the following problems: 1. The uniformity of the illumination system is poor, which cannot meet the requirements of high-precision lithography; 2. The mask manufacturing technology is complicated and the cost is...

AI Technical Summary

Problems solved by technology

However, the optical system of projection lithography in the prior art generally has the following problems: 1. The uniformity of the illumination system is poor, which cannot meet the requirements of high-precision lithography; 2. The mask manufacturing technology is complicated and the cost is high. The existing maskless projection technology is not suitable for making various microstructure components; 3. The projection system has large distortion and cannot meet the requirements of ultra-high-precision lithography; 4. The comprehensive cost is relatively expensive

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