Simultaneous localization photoetching exposure device and method
A technology of synchronous positioning and exposure device, which is applied in the field of photolithography exposure, can solve problems such as errors, achieve the effect of precise synchronous positioning exposure, and eliminate movement exposure errors
Active Publication Date: 2013-03-27
海门卡汶纺织品有限公司
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Problems solved by technology
In the process of photolithography and etching, since the workpiece to be etched during the exposure process is always in motion, the system will generate motion exposure errors during the working process
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[0034] The invention discloses a synchronous positioning lithography exposure device, which comprises a two-dimensional motion platform, a piezoelectric ceramic motion module located directly above the two-dimensional motion platform for carrying objects to be etched, and a light source located above the piezoelectric ceramic motion module The generating device, the two-dimensional motion platform includes a first transmission device that controls the two-dimensional motion platform to move in a first direction, and the piezoelectric ceramic motion module includes a second transmission device that controls the piezoelectric ceramic motion module to move in a second direction opposite to the first direction. transmission.
[0035] Correspondingly, the present invention also discloses a method for synchronous positioning photolithography exposure, which includes the following steps:
[0036] S1. Fix the object to be etched on the piezoelectric ceramic motion module, and turn on ...
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The invention discloses a simultaneous localization photoetching exposure device and a simultaneous localization photoetching exposure method. The device comprises a dimensional motion platform, a piezoelectric ceramic motion module and a light source generator, wherein the piezoelectric ceramic motion module is located right above the dimensional motion platform and used for bearing a to-be-etched object, and the light source generator is located above the piezoelectric ceramic motion module; and the dimensional motion platform comprises a first transmission gear and a second transmission gear, the first transmission gear is used for controlling the dimensional motion platform to move along a first direction, and the second transmission gear is used for controlling the piezoelectric ceramic motion module to move along a second direction opposite to the first direction. According to the simultaneous localization photoetching exposure device and the simultaneous localization photoetching exposure method, the precise simultaneous localization exposure is achieved by controlling the matching relation between a motion time and an exposure time of the piezoelectric ceramic motion module, and the motion exposure error is eliminated.
Description
technical field [0001] The invention relates to the technical field of photolithography exposure, in particular to a synchronous positioning photolithography exposure device and method. Background technique [0002] "Laser interference lithography" is an extremely important method to achieve pixelated structures below 100 nanometers. It has the advantages of low cost, no mask, high efficiency, no contamination, large area and low environmental requirements. The importance of laser interference lithography lies in: [0003] (1) easy to obtain nanostructure; [0004] (2) Parallel lithography, high efficiency, combined with information optics technology, can realize quasi-periodic and non-periodic structures; [0005] (3) Realize super large format. [0006] In recent years, laser interference lithography has developed rapidly. Beam scanning lithography technology is a new method of interference lithography technology that uses scanning control methods to splicing interfere...
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Inventor 陈涛孙立宁潘明强刘吉柱王阳俊陈立国汝长海任子武郭浩厉茂海陈国栋林锐
Owner 海门卡汶纺织品有限公司