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Mask alignment optical system

An optical system and mask alignment technology, applied in the field of mask alignment optical system, can solve the problem of difficult to identify alignment marks, and achieve the effect of good performance

Inactive Publication Date: 2013-05-08
HITACHI HIGH-TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0013] If the alignment mark is arranged outside the vapor deposition area, the mask frame and the mask overlap, so that it is difficult to recognize the alignment mark in the back reflection of the mask frame.

Method used

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  • Mask alignment optical system
  • Mask alignment optical system

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Embodiment Construction

[0026] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Furthermore, in the following detailed description, first, the outline of the organic EL device manufacturing apparatus using the present invention, especially the organic EL film forming apparatus thereof, will be described, and the mask pair of the present invention in the apparatus will be described in detail. Quasi-optical system.

[0027] The organic EL film forming apparatus constituting the organic EL device manufacturing apparatus functions as a vacuum deposition chamber for forming an EL layer on a substrate by vapor deposition of a light-emitting material in a vacuum environment. Hereinafter, the vacuum deposition chamber will be described together with a transfer chamber. indicated in the attached figure 1 middle. In the figure, the conveying robot 5 in the conveying chamber has an arm 51 having a three-link structure, and the arm 51 ca...

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Abstract

The present invention provides a mask alignment optical system where a transparent illumination method is utilized and which is excellent in performance and can effectively use a mask. The mask alignment optical system aligns a metal mask (102) with a substrate (6), and is provided with a fixed frame (101) and a carrying platform (201), wherein the fixed frame (101) is formed around the metal mask with L-shaped light guide paths forming at the four corners, and the carrying platform (201) carries the substrate on the surface with light guide paths forming at the four corners. Alignment with the metal mask is performed by using transmission images of alignment marks formed by light guided into the light guide paths formed on part of the fixed frame and the light guide paths formed on part of the carrying platform.

Description

technical field [0001] The present invention relates to mask alignment for arranging a metal mask with respect to a substrate in order to manufacture an organic EL device, and particularly to a mask alignment optical system using a part of a frame of the mask. Background technique [0002] As a powerful method for manufacturing organic EL (electroluminescence) devices, there is a vacuum evaporation method. In this vacuum evaporation, it is necessary to align the substrate and the mask. In addition, in recent years, for organic EL equipment, the size of the processing substrate has been increasing. For example, the size of the substrate in the G6 generation is 1500mm × 1800mm. Along with the increase in the size of the substrate, of course, the mask also has Large-scale, its size even reached about 2000mm × 2000mm. In particular, in an organic EL device using a steel mask, the weight reaches 300 kg, and conventionally, the substrate and the mask are placed horizontally and ...

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Application Information

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IPC IPC(8): C23C14/04
CPCH05B33/10
Inventor 松本房重龟山大树郑载勋李相雨
Owner HITACHI HIGH-TECH CORP