Light-emitting diode with diamond-like layer, its production method and application
A technology of light-emitting diodes and diamond layers, which is applied to electrical components, circuits, semiconductor devices, etc., can solve problems such as poor luminous efficiency and lifespan of light-emitting diodes, damaged electrical connections, and poor heat dissipation of light-emitting diodes. The luminous efficiency and life are not good, and the effect of increasing heat dissipation efficiency
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[0061] Another aspect of the present invention provides a method for preparing a light-emitting diode with a conductive diamond-like layer, including the steps of: providing a temporary substrate; forming a semiconductor epitaxial multilayer composite structure on the temporary substrate, wherein the semiconductor epitaxial The multilayer composite structure includes: a first semiconductor epitaxial layer and a second semiconductor epitaxial layer, and the first semiconductor epitaxial layer and the second semiconductor epitaxial layer are stacked; on the side of the semiconductor epitaxial multilayer composite structure forming an insulating diamond-like carbon layer; and forming a first electrode and the second electrode, so that the first semiconductor epitaxial layer of the semiconductor epitaxial multilayer composite structure is electrically connected to the first electrode, and the semiconductor The second semiconductor epitaxial layer of the epitaxial multilayer composi...
Embodiment 1
[0073] refer to Figure 2A to Figure 2I , which shows a structural schematic diagram of the process flow of the method for preparing a light-emitting diode with a conductive diamond-like layer of the present invention.
[0074] First, if Figure 2A As shown, a temporary substrate 21 is provided. Next, if Figure 2B As shown, a semiconductor epitaxial multilayer composite structure 22 is formed on the temporary substrate 21 . The semiconductor epitaxial multilayer composite structure 22 may include: a first semiconductor epitaxial layer 221, an active intermediate layer 222, and a second semiconductor epitaxial layer 223, wherein the first semiconductor epitaxial layer 221, the active intermediate layer 222, It is laminated with the second semiconductor epitaxial layer 223 , and the active intermediate layer 222 is sandwiched between the first semiconductor epitaxial layer 221 and the second semiconductor epitaxial layer 223 . In this embodiment, the material of the semicon...
Embodiment 2
[0082] refer to image 3 , is a structural schematic diagram of the on-chip package structure of this embodiment.
[0083] like image 3 As shown, the chip-on-chip packaging structure includes: a circuit carrier 3; Connect the circuit carrier 3, wherein the circuit carrier includes an insulating layer 31, a circuit substrate 30, and wiring (not shown), the material of the insulating layer 31 can be selected from diamond-like carbon, aluminum oxide, ceramics, containing Diamond epoxy resin, or a mixture of the above materials, the circuit substrate 30 is a metal plate, a ceramic plate or a silicon substrate.
[0084] In the package-on-chip structure, the electrical connection between the first electrode 25 and the second electrode 27 and the circuit carrier 3 can be achieved by a common method in the technical field of the present invention, such as wire bonding.
[0085] Accordingly, in the above-mentioned chip-on-board package structure (chiponboard, COB) of the present in...
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