Thin film test sample platform of X-ray diffraction instrument

A technology for testing samples and diffractometers, which is applied in the direction of material analysis using radiation diffraction, etc., can solve the problems of poor versatility of the sample stage, and achieve the effects of improving measurement efficiency, avoiding waste, and strong applicability

Active Publication Date: 2013-09-11
SHENZHEN UNIV
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to solve the problem of poor versatility of the sample stage in X-ray diffraction measurement, and provides a new type of X-ray diffractometer film sample test bench, which also has good applicability to powder samples

Method used

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  • Thin film test sample platform of X-ray diffraction instrument
  • Thin film test sample platform of X-ray diffraction instrument
  • Thin film test sample platform of X-ray diffraction instrument

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Embodiment Construction

[0015] refer to image 3 First, process a right-angle "Z"-shaped fixed bracket (1), open a screw hole (4) in the center of the lower plate (3), and open three spring hook holes ( 5), three spring hook holes (5) are also opened at the corresponding positions of the flat sample holder (6) and the lower plate (3) of the fixed bracket, and three identical springs (7) are connected to the fixed bracket through the spring hook holes (5). On the bracket (1) and the sample stage (6), the adjusting screw (8) passes through the screw hole (4) on the lower plate of the fixed bracket (1), and contacts with the bottom surface of the sample stage (6), and the adjusting screw (8) , the top sample stage (6) plate is moved to a suitable position, so that the surface of the sample (9) is at the same level as the upper surface of the fixed support (1). Finally, insert the end of the upper plate (2) of the fixed bracket (1) of the sample testing platform into the corresponding position of the X-...

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Abstract

The invention provides a thin film test sample platform of an X-ray diffraction instrument. The thin film test sample platform is formed by a fixing bracket, three springs, a flat plate type sample holder and an adjusting screw, wherein the fixing bracket is in a right-angle Z shape; a screw hole and three spring hook holes are formed in the center of a flat plate below the fixing bracket; three spring pull hook holes are also formed in the flat plate type sample holder; the flat plate type sample holder passes through the three springs to be respectively connected with the fixing bracket through the pull hook holes; the adjusting screw penetrates through the screw hole of the fixing bracket to be contacted with the lower bottom face of the sample holder; the height of the sample holder can be freely adjusted through the adjusting screw; finally, the surface of a sample and the upper surface of the fixing bracket are on the same plane. According to the thin film test sample platform, X-ray diffraction measurement of the samples with the different specifications can be conveniently carried out, and particularly, the X-ray diffraction measurement of thin film samples with different substrate thicknesses can be realized.

Description

technical field [0001] The invention is related to the measurement of X-ray diffractometer samples, especially the measurement of thin film samples, which can be used for the measurement of thin film samples and other powder samples. technical background [0002] X-ray diffraction measurement is an important means to identify the phase structure of materials. When X-rays are incident on the crystal surface of a lattice lattice at a grazing angle θ, under the conditions of Bragg's equation, diffraction lines strengthened by superposition will be obtained in the reflection direction. The reflection is obtained from the reflective surface that meets the conditions of the Bragg equation at each θ angle. After measuring θ, the lattice spacing of the material, the size and type of the unit cell, etc. can be determined. According to the intensity of the diffraction line, the unit cell can be further determined. Arrangement of atoms in the interior. In the X-ray diffraction measur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/20
Inventor 张东平李岩范平梁广兴郑壮豪罗景庭
Owner SHENZHEN UNIV
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