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Siloxane-group-containing long-wave-absorbing photoinitiator and preparation method thereof

A siloxane group, light-absorbing technology, used in chemical instruments and methods, compounds of Group 5/15 elements of the periodic table, coatings, etc. , Improve the interface photo-initiated efficiency, improve the effect of adhesion

Active Publication Date: 2013-10-02
新丰博兴聚合材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photosensitive groups of such so-called nano-type photoinitiators all rely on the photoinitiators of the traditional short-wavelength light-absorbing alpha-hydroxyalkyl phenyl ketone structure, and the maximum light-absorbing wavelength is usually only about 320nm. Molecular hydroxyalkyl phenyl ketone photoinitiators are used in combination, their photoinitiation performance is impaired by competitive shielding from light absorption

Method used

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  • Siloxane-group-containing long-wave-absorbing photoinitiator and preparation method thereof
  • Siloxane-group-containing long-wave-absorbing photoinitiator and preparation method thereof
  • Siloxane-group-containing long-wave-absorbing photoinitiator and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Take 28.8g (0.1mol) of 2,4,6-trimethylbenzoylphenylphosphonic acid in a three-necked flask, dissolve it in 100ml of toluene, add γ-(2,3-epoxypropoxy)propyltrimethyl Oxysilane (KH-560) 23.6g (0.1mol), stirred and heated at 55°C for 2 hours, detected by infrared spectroscopy, the reaction raw material was at 913cm -1 The characteristic absorption peak of epoxy disappears. Rotary evaporation under reduced pressure, remove solvent, obtain product 52.3g, product proton nuclear magnetic spectrum (CDCl 3 , TMS) δ (ppm): 0.54(t,2H), 1.52(m,2H), 2.13(s,3H), 2.33(s,6H), 3.37(t,2H), 3.51(s,9H), 3.44-3.72 (m, 1H+2H), 4.19 (d-d, 2H), 6.79 (s, 2H), 7.34 (m, 2H), 7.65 (m, 1H), 7.71 (m, 2H).

Embodiment 2

[0042] Take 28.8g (0.1mol) of 2,4,6-trimethylbenzoylphenylphosphonic acid in a three-necked flask, dissolve it in 100ml of toluene, add 3-[(2,3)-glycidoxy]propane 22.0g (0.1mol) of methyldimethoxysilane, stirred and heated at 55°C for 2 hours, detected by infrared spectroscopy, the reaction raw materials were at 913cm -1 The characteristic absorption peak of epoxy disappears. Rotary evaporation under reduced pressure, remove solvent, obtain product 50.6g, product proton nuclear magnetic spectrum (CDCl 3 , TMS) δ (ppm): 0.18(s,3H), 1.01(t,2H), 1.54(m,2H), 2.13(s,3H), 2.33(s,6H), 3.36(t,2H), 3.53(s,6H),3.44-3.72(m,1H+2H),4.18(d-d,2H),6.79(s,2H),7.34(m,2H),7.65(m,1H),7.71(m,2H ).

Embodiment 3

[0044] Take 28.8g (0.1mol) of 2,4,6-trimethylbenzoylphenylphosphonic acid in a three-necked flask, dissolve it in 100ml of toluene, add 22.0g of 5,6-epoxyhexyltrimethoxysilane ( 0.1mol), stirred and heated at 55°C for 2 hours, detected by infrared spectroscopy, the reaction raw materials were at 908cm -1 The characteristic absorption peak of epoxy disappears. Rotary evaporation under reduced pressure, remove solvent, obtain product 50.7g, product proton nuclear magnetic spectrum (CDCl 3 , TMS) δ (ppm): 0.59(t, 2H), 1.29-1.38(m, 2H+2H), 1.46(d-d, 2H), 2.13(s, 3H), 2.33(s, 6H), 3.34(m ,1H), 3.53(s,9H), 4.18(d-d,2H), 6.79(s,2H), 7.34(m,2H), 7.65(m,1H), 7.71(m,2H).

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Abstract

The invention discloses a siloxane-group-containing long-wave-absorbing photoinitiator of which the structural formula is disclosed in the specification, wherein Y represents a substituted ether chain structure or substituted alkylidene structure, R is methyl or ethyl group, n is a positive integer ranging from 0 to 2, and R' is methyl or ethyl group. The photoinitiator disclosed by the invention has the interfacial anchoring function of silicate and metal, and is beneficial to starting photopolymerization crosslinking from the interface. The absorbed wavelength of the photoinitiator is obviously higher than that of the alpha-hydroxyalkyl phenone photoinitiator; and the photoinitiator forms gradient distribution in the coating, thereby avoiding the light absorption shielding effect of the hydroxyalkyl photoinitiator in the coating on the interfacial anchoring photoinitiator of the metal substrate, and enhancing the interfacial photoinitiation efficiency. The photoinitiator disclosed by the invention can finally enhance the adhesiveness of the photocuring coating onto the silicate substrate and many other metal substrates, and is incomparable by the traditional photoinitiator in the aspect of adhesiveness maintenance after boiling.

Description

technical field [0001] The invention relates to a long-wave absorbing photoinitiator containing siloxane groups and a preparation method thereof. Background technique [0002] Photocuring refers to the process in which the formulation material is instantly transformed from liquid to crosslinked solid state under the irradiation of ultraviolet light. The photocuring formulation generally includes photocurable resin, acrylate reactive diluent, photoinitiator and other additives. The essence of the photocuring process is that the photoinitiator decomposes rapidly under the irradiation of ultraviolet light, generates active free radicals, and triggers the instantaneous polymerization and crosslinking of the photocurable resin and the reactive diluent. Among them, the photoinitiator is generally used in an amount of 2 to 5%. Although the proportion is small, the effect is very critical. However, the conventional photoinitiators are all small molecular organic compounds, which ar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F2/48C07F9/32C09D7/00
Inventor 庞来兴
Owner 新丰博兴聚合材料有限公司
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