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Method for producing photosensitive substrate composition for light-shielding layer formation

A manufacturing method and photosensitive technology, which are used in photosensitive materials for opto-mechanical equipment, photo-engraving processes for patterned surfaces, optics, etc., to achieve high-quality results

Active Publication Date: 2018-10-26
TOKYO OHKA KOGYO CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, impurities and foreign substances present in the resist composition are the cause of flaws (surface defects) and pinholes in the resist pattern

Method used

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  • Method for producing photosensitive substrate composition for light-shielding layer formation
  • Method for producing photosensitive substrate composition for light-shielding layer formation
  • Method for producing photosensitive substrate composition for light-shielding layer formation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～3

[0186] Next, substrate solutions 1 to 3 except for the colorant component in the composition shown in Table 2 were prepared, filtered through a PTFE membrane (manufactured by ADVANTEC Corporation) with a pore size of 0.2 μm, and the above-mentioned colored solution as (G) component A predetermined amount of the agent was dispersed in each substrate solution, and a photosensitive substrate composition for forming a light-shielding layer having the composition shown in Table 2 was prepared. In addition, the unit of the numerical value in Table 2 is a mass part.

[0187] 【Table 2】

[0188]

[0189] DPHA(A2): dipentaerythritol hexaacrylate

[0190] Photopolymerization initiator (A3): In Example 1, photopolymerization initiator 1 (substrate solution 1) was used. In Example 2, photopolymerization initiator 2 (substrate solution 2) was used. In Example 3, photopolymerization initiator 3 (substrate solution 3) was used.

[0191] Colorant (G): 25% by mass of carbon black, solven...

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Abstract

PROBLEM TO BE SOLVED: To provide a high quality black matrix in which occurrence of pinholes and the like is prevented.SOLUTION: A manufacturing method of a photosensitive substrate composition for forming a light-shielding layer is characterized by dissolving a photosensitive substrate component (A) in an organic solvent component (S) to obtain a substrate solution, which is then filtered with a PTFE film having a pore size of 1 μm or less, followed by dispersing a pigment component (G) in the substrate solution. The photosensitive substrate component (A) contains an alkali-soluble resin (A1), a photopolymerizable compound (A2) or a photopolymerization initiator (A3).

Description

technical field [0001] This invention relates to the manufacturing method of the photosensitive base material composition for light shielding layer formation. Background technique [0002] For example, in the case of a color filter used in a color display device, it usually has a grid-like black light-shielding layer called a black matrix, which is composed of red (R), green (G), and blue (B) colors. The structure of pixels. [0003] As one of the manufacturing methods of the color filter, a method of forming a colored layer of the color filter by an inkjet method using a black matrix as a partition wall has been proposed (for example, Patent Document 1 below). [0004] In addition, not limited to color filters, in various display devices, there are cases where the contrast of an image is improved by providing a black matrix on the boundary between pixels. [0005] The black matrix is ​​formed, for example, by lithography using a resist composition containing a black pigme...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027
Inventor 中绪卓盐田大石川达郎
Owner TOKYO OHKA KOGYO CO LTD
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