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Device and method for manufacturing polysilicon by using dummy bar based on electron beam smelting

A technology for manufacturing a device and a dummy rod, which is applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of production efficiency of pollutants, high production cost, and unsuitability for the production of semiconductor-grade silicon.

Inactive Publication Date: 2015-08-26
KOREA INST OF ENERGY RES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in addition to high production costs, this silicon production process also produces a large amount of pollutants and has low production efficiency
[0005] Therefore, the silicon production process is not suitable for the production of semiconductor-grade silicon used as a raw material for photovoltaic cells, and vigorous efforts have been made to develop metallurgical refining processes that can achieve mass production of high-purity silicon at low cost

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  • Device and method for manufacturing polysilicon by using dummy bar based on electron beam smelting
  • Device and method for manufacturing polysilicon by using dummy bar based on electron beam smelting
  • Device and method for manufacturing polysilicon by using dummy bar based on electron beam smelting

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Embodiment Construction

[0022] Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the present invention is not limited to the following embodiments, and the present invention can also be implemented in different ways, and the embodiments are provided in order to make the disclosure of the present invention complete and to enable those skilled in the art to fully understand the present invention . The scope of the present invention is limited only by the appended claims and their equivalents. The same reference numerals are used to refer to the same parts throughout the specification.

[0023] A device and method for manufacturing polysilicon based on electron beam melting using a dummy bar according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0024] figure 1 is a schematic diagram of an apparatus for manufacturing polysilicon based on el...

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Abstract

The invention provides a high-purity polysilicon manufacturing method by utilizing a dummy bar as a starting block and a device thereof. The device comprises a vacuum chamber; a first electron gun and a second electron gun, which are arranged on the upper side of the vacuum chamber and used for irradiating electron beams to the vacuum chamber; a silicon melting unit, which is arranged on a first electron beam irradiation area corresponding to the first electron gun and supplied with powdery raw material silicon, which has been melt by the first electron beam; and a one-way solidifying unit, which is arranged on a second electron beam irradiation area corresponding to the second electron gun. A starting block is arranged in the one-way solidifying unit, the starting block is driven downward to transport the molten silicon, and a cooling channel, which makes the molten silicon to solidify and be casted from the bottom to the top, is formed in the lower part of the one-way solidifying unit. The starting block comprises a dummy bar, which comprises a silicon button, which is jogged with the upper part of the dummy bar.

Description

technical field [0001] The present invention relates to a polysilicon manufacturing technology, and in more detail, relates to a method and device for manufacturing polysilicon based on electron beam smelting using a dummy bar, thereby improving silicon refining efficiency. Background technique [0002] The purity of silicon is usually represented by 2N, 3N, 6N, 11N, etc. Here, the number in front of 'N' represents the number of 9 in weight percentage (wt%), for example, 2N represents 99% purity, 6N represents 99.9999% purity, and 11N represents 99.999999999% purity. [0003] Semiconductor-grade silicon requires ultra-high purity of 11N. However, as known in the prior art, silicon, which is used as a raw material of a photovoltaic cell and has a relatively low purity of 5N˜7N, provides light conversion efficiency similar to that of high-purity silicon with 11N. [0004] Semiconductor-grade silicon is produced through a chemical vaporization process. However, in addition t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/037
Inventor 张普允李镇石金儁秀安永洙
Owner KOREA INST OF ENERGY RES