A kind of array substrate and its preparation method, display device

Abstract

Embodiments of the present invention provide an array substrate, a preparation method thereof, and a display device, which relate to the field of display technology, and can reduce the number of patterning processes and save costs. The method includes: forming a pattern layer including a pixel electrode, a gate electrode, and a pattern layer on a substrate through a patterning process once; A patterning process forms a gate insulating layer, a pattern layer including at least a metal oxide semiconductor active layer, and a pattern layer including at least an etching stopper layer; wherein, a first via hole exposing the pixel electrode is formed above the pixel electrode; On the substrate of the etch barrier layer, a pattern layer including source electrodes, drain electrodes and data lines is formed through a patterning process; wherein, both the source electrodes and the drain electrodes are in contact with the metal oxide semiconductor active layer, and the drain electrodes and the pixel electrodes pass through The first via hole is electrically connected. Used in the preparation of array substrates, display devices, etc.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a preparation method thereof, and a display device. Background technique [0002] According to the different materials used in the active layer in the thin film transistor (ThinFilmTransistor, referred to as TFT) structure, TFT can be divided into: amorphous silicon TFT, polysilicon TFT, single crystal silicon TFT and metal oxide semiconductor TFT; among them, metal oxide The material semiconductor TFT has high carrier mobility, which can better meet the driving requirements of super-large liquid crystal displays, and the metal oxide semiconductor TFT also has the characteristics of uniform composition, low cost, and high transparency. Therefore, it has attracted the attention of researchers. [0003] In the prior art, when etching the metal layer of the source electrode and the drain electrode above the metal oxide semiconductor active layer, the me...

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Problems solved by technology

And each patterning process includes processes such as film formation, exposure, development, etching and stripping; obviously, the more times of patterning process, the higher the manufacturing cost of TFT array substrate, correspondingly, it will lead to the preparation of TFT array substrate. The increase in process difficulty may cause instability in the performance of the TFT array substrate, that is, the lower the yield of the TFT array substrate

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