Method for manufacturing array substrate
A manufacturing method and array substrate technology, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve problems such as not detailed one by one, and achieve the effect of avoiding parasitic capacitance and improving Flicker
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[0043]In the manufacturing method of the array substrate, the array substrate and the display device according to the embodiment of the present invention, after forming the semiconductor layer and the source-drain electrode layer for making the source-drain electrodes, the source-drain electrodes are not directly made, but reserved for Form the semiconductor layer and the source-drain electrode layer in the region of the source-drain electrode layer, and then after forming a transparent conductive layer (such as a commonly used ITO layer), process the transparent conductive layer to form an extension extending to the position where the source electrode is scheduled to be formed, Finally, the source-drain electrode layer located outside the predetermined position for forming the source-drain electrode in the reserved area is removed to finally form the source-drain electrode. In the above manner, the overlapping part of the extension part and the gate electrode is completely loc...
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