Ingot furnace for producing pseudo-single crystal silicon ingot and ingot casting method for pseudo-single crystal silicon ingot
A technology similar to single crystal silicon and ingot furnace, which is applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., to achieve the effect of facilitating mass promotion
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Embodiment 1
[0047] In the middle of the side heat insulating layer 80, a circle of graphite hard felt is set toward the crucible 50. The thickness of the graphite hard felt is 70mm, the width is 30mm, and the distance from the side heater 70 is 160mm.
[0048] Step 1: For 120 minutes, maintain the temperature at the top temperature measuring point at 1185°C, volatilize the impurities on the surface of the silicon material, and discharge them through the vacuum pump of the ingot furnace to ensure the purity of the silicon material, and the height of the side insulation layer 80 is zero.
[0049] Step 2: In 270 minutes, the temperature at the temperature measuring point on the inner top rises rapidly to 1510°C, and the position of the heat insulation layer 80 on the side is zero.
[0050] Step 3: In 45 minutes, the temperature at the temperature measuring point on the inner top rises slowly to 1530°C, and the position of the heat insulation layer 80 on the side is zero.
[0051] The fourth ...
Embodiment 2
[0056] In the middle of the side heat insulating layer 80, a circle of graphite hard felt is set towards the crucible 50. The thickness of the graphite hard felt is 10mm, the width is 30mm, and the distance from the side heater 70 is 350mm.
[0057] Step 1: For 90 minutes, maintain the temperature at the top temperature measuring point at 1135°C, volatilize the impurities on the surface of the silicon material, and discharge them through the vacuum pump of the ingot furnace to ensure the purity of the silicon material, and the height of the side insulation layer 80 is zero.
[0058] Step 2: In 210 minutes, the temperature at the temperature measuring point on the inner top rises rapidly to 1490°C, and the position of the heat insulation layer 80 on the side is zero.
[0059] Step 3: In 15 minutes, the temperature at the temperature measuring point on the inner top rises slowly to 1520°C, and the position of the heat insulation layer 80 on the side is zero.
[0060] The fourth ...
Embodiment 3
[0065] In the middle of the side heat insulating layer 80, a circle of graphite hard felt is set towards the crucible 50. The thickness of the graphite hard felt is 50mm, the width is 95mm, and the distance from the side heater 70 is 200mm.
[0066] Step 1: For 120 minutes, maintain the temperature at the top temperature measuring point at 1160°C, volatilize the impurities on the surface of the silicon material, and discharge them through the vacuum pump of the ingot furnace to ensure the purity of the silicon material, and the height of the side insulation layer 80 is zero.
[0067] Step 2: In 255 minutes, the temperature at the temperature measuring point on the inner top rises rapidly to 1505°C, and the position of the heat insulation layer 80 on the side is zero.
[0068] Step 3: For 40 minutes, the temperature at the temperature measuring point on the inner top rises slowly to 1530°C, and the position of the heat insulation layer 80 on the side is zero.
[0069] The fourt...
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Abstract
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