Ingot casting furnace for producing quasi-single crystal silicon ingot and ingot casting method for quasi-single crystal silicon ingot
A technology similar to single crystal silicon and ingot furnace, which is applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., to achieve the effect of facilitating mass promotion
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Embodiment 1
[0047] In the middle of the side heat insulation layer 80, a circle of graphite hard felt is set toward the crucible 50, the thickness of the graphite hard felt is 70mm, the width is 30mm, and the distance from the side heater 70 is 160mm.
[0048] The first step: 120 minutes, maintain the top temperature measuring point temperature of 1185 ℃, the surface impurities of the silicon material are volatilized and discharged through the vacuum pump of the ingot furnace to ensure the purity of the silicon material, and the height of the side insulation layer 80 is zero.
[0049] The second step: 270 minutes, the temperature of the inner top temperature measurement point quickly rises to 1510 ℃, and the side insulation layer 80 position is zero.
[0050] The third step: 45 minutes, the temperature of the inner top temperature measurement point slowly rises to 1530°C, and the side insulation layer 80 position is zero.
[0051] The fourth step: 230 minutes, keep the final state of the third ste...
Embodiment 2
[0056] In the middle of the side heat insulation layer 80, a circle of graphite hard felt is set toward the crucible 50, the thickness of the graphite hard felt is 10mm, the width is 30mm, and the distance from the side heater 70 is 350mm.
[0057] The first step: for 90 minutes, maintain the top temperature measuring point temperature of 1135℃, and the impurities on the surface of the silicon material will volatilize and be discharged through the vacuum pump of the ingot furnace to ensure the purity of the silicon material. The height of the side insulation layer 80 is zero.
[0058] The second step: 210 minutes, the temperature of the inner top temperature measurement point quickly rises to 1490 ℃, and the position of the side insulation layer 80 is zero.
[0059] The third step: 15 minutes, the temperature of the inner top temperature measuring point slowly rises to 1520℃, and the position of the side insulation layer 80 is zero.
[0060] The fourth step: 170 minutes, keep the final...
Embodiment 3
[0065] In the middle of the side heat insulation layer 80, a circle of graphite hard felt is set toward the crucible 50, the thickness of the graphite hard felt is 50mm, the width is 95mm, and the distance from the side heater 70 is 200mm.
[0066] The first step: 120 minutes, maintain the top temperature measuring point temperature of 1160 ℃, the surface impurities of the silicon material are volatilized, and are discharged through the vacuum pump of the ingot furnace to ensure the purity of the silicon material. The height of the side insulation layer 80 is zero.
[0067] The second step: 255 minutes, the temperature of the inner top temperature measuring point quickly rises to 1505℃, and the position of the side insulation layer 80 is zero.
[0068] The third step: 40 minutes, the temperature of the inner top temperature measurement point slowly rises to 1530 ℃, and the side insulation layer 80 position is zero.
[0069] The fourth step: 215 minutes, maintaining the final state of t...
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