Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Moisturizing sun cream

A sunscreen, moisturizing technology, applied in cosmetics, skin care preparations, cosmetic preparations, etc., to achieve the effect of repairing tissue and accelerating the growth of cells

Inactive Publication Date: 2014-03-26
QINGDAO CHENXUTONG COMMERCE & TRADE
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although many varieties of sunscreens have good sunscreen effects, they still need to be further improved for continuous facial care, nutritional supplements or enhancement of beauty functions.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0009] Embodiment 1, a kind of moisturizing sunscreen, is made of the following raw materials in parts by weight: 2 parts of dihydroxyacetone, 3 parts of polyoxyethylene sorbitan monostearate, 4 parts of superfine titanium dioxide, stearic acid 2 parts, 10 parts of aloe vera powder, 3 parts of endothelin antagonist, 4 parts of cinnamic acid, 10 parts of octyl salicylate, 15 parts of hydroxyethyl cellulose, 8 parts of isononyl isononanoate, cyclopolydimethyl 7 parts of siloxane, 6 parts of cetyl polydimethylsiloxane, 3 parts of glyceryl monostearate, 2 parts of triethanolamine, 20 parts of deionized water.

Embodiment 2

[0010] Embodiment 2, a kind of moisturizing sunscreen, is made of the following raw materials in parts by weight: 4 parts of dihydroxyacetone, 4 parts of polyoxyethylene sorbitan monostearate, 8 parts of superfine titanium dioxide, stearic acid 3 parts, 15 parts of aloe vera powder, 4 parts of endothelin antagonist, 6 parts of cinnamic acid, 15 parts of octyl salicylate, 20 parts of hydroxyethyl cellulose, 12 parts of isononyl isononanoate, cyclopolydimethyl 11 parts of siloxane, 8 parts of cetyl polydimethylsiloxane, 6 parts of glyceryl monostearate, 3 parts of triethanolamine, 35 parts of deionized water.

Embodiment 3

[0011] Embodiment 3, a kind of moisturizing sunscreen, is made of the following raw materials in parts by weight: 6 parts of dihydroxyacetone, 6 parts of polyoxyethylene sorbitan monostearate, 12 parts of superfine titanium dioxide, stearic acid 5 parts, 20 parts of aloe vera powder, 6 parts of endothelin antagonist, 8 parts of cinnamic acid, 20 parts of octyl salicylate, 25 parts of hydroxyethyl cellulose, 16 parts of isononyl isononanoate, cyclopolydimethyl 14 parts of siloxane, 12 parts of cetyl polydimethylsiloxane, 9 parts of glyceryl monostearate, 4 parts of triethanolamine, 50 parts of deionized water.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a moisturizing sun cream. The moisturizing sun cream is prepared from the raw materials in parts by weight: 2-6 parts of dioxyacetone, 3-6 parts of polyoxyethylene 20 sorbitan monostearate, 4-12 parts of ultrafine titanium dioxide, 2-5 parts of stearic acid, 10-20 parts of aloe powder, 3-6 parts of endothelin antagonists, 4-8 parts of cinnamic acid, 10-20 parts of octyl salicylate, 15-25 parts of hydroxyethyl cellulose, 8-16 parts of isononyl isononanoate, 7-14 parts of cyclomethicone, 6-12 parts of cetyl dimethicone, 3-9 parts of glycerin monostearate, 2-4 parts of triethanolamine and 20-50 parts of deionized water. The invention provides the moisturizing sun cream which has the function of preventing ultraviolet rays and sunshine and also has the actions of skin moistening, moisturizing, skin injury repairing and skin moisture replenishing.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a moisturizing sunscreen. Background technique [0002] Ultraviolet rays are a kind of light wave that is more harmful to the human body in sunlight. Excessive exposure to ultraviolet rays can cause erythema and dark spots on the skin, accelerate skin aging, and seriously cause skin cancer. Sunscreen preparations currently on the market mainly include sunscreen oil, sunscreen lotion, sunscreen honey, sunscreen cream, etc. Sunscreens, also known as UV shielding agents, protect the skin by reflecting and scattering ultraviolet rays. Ultraviolet rays have negative effects on cell DNA, membranes, and the immune system. Adding sunscreens to sunscreen and skin care products can provide protection for cells and the immune system. Protection, titanium dioxide is one of the typical sunscreens. Although many types of sunscreens have good sunscreen effects, they still need to be further...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/97A61Q17/04A61Q19/00
Inventor 张琦
Owner QINGDAO CHENXUTONG COMMERCE & TRADE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com