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Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution

A technology of concentration adjustment and developing solution, which is applied in the direction of photoplate making process, photography, liquid processing equipment and other directions on the pattern surface, which can solve the problem of the influence of pattern line width and achieve the effect of high-quality development treatment

Active Publication Date: 2014-06-11
MITSUBISHI CHEM ENG CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As a result, it affects the line width of the pattern formed on the substrate by etching

Method used

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  • Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
  • Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
  • Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution

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Embodiment Construction

[0020] Hereinafter, an embodiment of a developer concentration adjustment method and a developer preparation device according to the present invention will be described with reference to the drawings.

[0021] The concentration adjustment method of the developer of the present invention (hereinafter referred to as "the concentration adjustment method") is a method for adjusting the concentration of the developer in the development process of the photoresist in the development process including the rotary development device, the coating development device and the like. The concentration adjustment method of the alkali concentration of the alkaline developing solution (hereinafter referred to simply as "developing solution") to be used. In addition, the developer preparation device (hereinafter simply referred to as "preparation device") of the present invention is a preparation device for preparing the developer. The present invention is particularly suitable for the case where...

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Abstract

This invention provides a method for regulating the concentration of a developing solution, which can regulate the alkali concentration of an alkaline developing solution used in a photoresist development process so that high-quality development treatment can be carried out, and an apparatus for preparing the developing solution. In the method for regulating the concentration of a developing solution, the concentration of an alkali in the developing solution and the concentration of a carbonate in the developing solution are specified, and the alkali concentration is regulated based on a previously provided relationship between alkali concentration and carbonate concentration, which can realize such a dissolving capability that can render the CD value obtained by the development treatment constant. The apparatus for preparing a developing solution comprises a preparation tank, a feed line for feeding a developing solution to a development process, a recovery line for receiving a used developing solution, a stock solution feed line for feeding a fresh developing solution stock to the preparation tank, a concentration meter for detecting the concentration of an alkali in the developing solution and the concentration of a carbonate in the developing solution, and a control unit for controlling the feed of the developing solution stock based on a specific relation.

Description

[0001] This application is a divisional application of the patent application with the same name filed on November 29, 2007 with the application number 200780040488.9. technical field [0002] The invention relates to a method for adjusting the concentration of a developing solution, a preparation device and a developing solution. Specifically, the present invention relates to a method for adjusting the alkali concentration of an alkaline developer used in the photoresist development process in the manufacturing process of liquid crystal substrates, printed circuit boards, etc., that is, to adjust the alkali concentration to the optimum Concentration, a method for adjusting the concentration of a developer that can maintain a certain development speed and perform a higher-quality development process, and a developer preparation device suitable for the implementation of the concentration adjustment method, and the above-mentioned concentration adjustment method and preparation d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/30G03F7/32G03D3/00
CPCG03D3/00G03F7/3071G03F7/322G03F7/30G03F7/32
Inventor 高崎纪博杉本建二棚桥亮太板东嘉文能谷敦子谷口克人
Owner MITSUBISHI CHEM ENG CORP
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