Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
A technology of concentration adjustment and developing solution, which is applied in the direction of photoplate making process, photography, liquid processing equipment and other directions on the pattern surface, which can solve the problem of the influence of pattern line width and achieve the effect of high-quality development treatment
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[0020] Hereinafter, an embodiment of a developer concentration adjustment method and a developer preparation device according to the present invention will be described with reference to the drawings.
[0021] The concentration adjustment method of the developer of the present invention (hereinafter referred to as "the concentration adjustment method") is a method for adjusting the concentration of the developer in the development process of the photoresist in the development process including the rotary development device, the coating development device and the like. The concentration adjustment method of the alkali concentration of the alkaline developing solution (hereinafter referred to simply as "developing solution") to be used. In addition, the developer preparation device (hereinafter simply referred to as "preparation device") of the present invention is a preparation device for preparing the developer. The present invention is particularly suitable for the case where...
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