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Photolithography equipment and device manufacturing method

A technology of lithography equipment and temperature control equipment, which is applied in the field of manufacturing devices, and can solve problems such as substrate expansion or contraction, wafer thermal deformation, etc.

Active Publication Date: 2017-11-28
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is because uncontrolled changes in the substrate temperature may cause the substrate to expand or contract such that the projected pattern is not positioned with the desired precision on the substrate (e.g. Overlay on the pattern above)
A known problem with this is that cleaning gases originating from the exposed resist and / or the wafer stage compartment to prevent contamination create a net negative thermal load on the wafer surface
This thermal load in turn may lead to large undesired thermal deformation of the wafer

Method used

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  • Photolithography equipment and device manufacturing method
  • Photolithography equipment and device manufacturing method
  • Photolithography equipment and device manufacturing method

Examples

Experimental program
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Embodiment Construction

[0027] figure 1 A lithographic apparatus 100 according to one embodiment of the invention is schematically shown. The apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. EUV radiation); a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask or mask Template) MA, and is connected with the first positioner PM that is configured to accurately position patterning device; ) W connected to a second positioning device PW configured to precisely position the substrate; and a projection system (e.g. a reflective projection system) PS configured to project the pattern given to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg, including one or more dies).

[0028] The illumination system may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, or other types of optical compon...

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PUM

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Abstract

A lithographic apparatus (100) comprising: a substrate table (WT) configured to hold a substrate (W); a projection system (PS) configured to project a patterned radiation beam through an opening (301) and to project the patterned radiation beam projected onto a target portion of the substrate; and a conduit (305, 306) having an outlet (306) in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus comprises a temperature control device (330) controlled by the control system and configured to control the temperature of the gas in the space between the projection system and the substrate, in particular to cool said gas.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of US Provisional Application 61 / 561,117, filed November 17, 2011, which is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to lithographic apparatus and methods for fabricating devices. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in integrated circuit (IC) manufacturing processes. In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, transfer of the pattern is accomplished by imaging the pattern onto a lay...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70633G03F7/70716G03F7/70875G03F7/70933
Inventor M·兰詹C·路吉腾F·詹森M·切尼斯霍夫
Owner ASML NETHERLANDS BV