Mask plate and substrate marker manufacturing method

A mask and marking technology, which is applied to the photoengraving process of the pattern surface, the exposure device of the photoengraving process, the instrument, etc., can solve the problems of economic loss, small test marks, unfavorable product monitoring, etc., so as to reduce the production cost and improve the Accuracy and the effect of reducing the difficulty of monitoring

Active Publication Date: 2014-08-20
BOE TECH GRP CO LTD +1
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  • Summary
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, when making substrate marks, the exposure accuracy of the exposure equipment is extremely high. If there is a positional deviation between the first exposure and the second exposure of the substrate, it is easy to cause the manufactured test marks to be smaller than the theoretically designed graphic outline size. As a result, the purpose of testing cannot be achieved, which is not only unfavorable for product monitoring, but also may bring huge economic losses

Method used

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  • Mask plate and substrate marker manufacturing method
  • Mask plate and substrate marker manufacturing method
  • Mask plate and substrate marker manufacturing method

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Embodiment Construction

[0020] In order to improve the accuracy of making substrate marks, reduce the difficulty of product monitoring, and reduce production costs, embodiments of the present invention provide a mask and a method for making substrate marks. In the technical solution of the present invention, the graphic outline of the protective mark mask portion of the mask is larger than the graphic outline of the test mark mask portion, and when the mask is used to expose two adjacent panel areas with double exposure areas, even the first There is a positional deviation between the first exposure and the second exposure, and it can also ensure that the graphic outline size of the test mark is consistent with the theoretical design. Therefore, using this substrate marking method can improve the accuracy of substrate marking, reduce the difficulty of product monitoring, and reduce Cost of production.

[0021] In order to make the purpose, technical solution and advantages of the present invention cl...

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Abstract

The invention relates to the technical field of display, and discloses a mask plate and a substrate marker manufacturing method, so as to improve the accuracy of the manufacture of substrate markers, reduce the difficulty in product monitoring, and lower the manufacture cost. The mask plate comprises a display area mask part and at least a pair of test marker mask parts, wherein each pair of the test marker mask parts is positioned at both sides of the display area mask part and is opposite, the outside, far away from the display area mask part, of each test marker mask part is correspondingly provided with a protective marker mask part, and the picture contour of the protective marker mask part is bigger than the picture contour of the test marker mask part. When the mask plate is used to expose the adjacent two panel areas with double exposure areas, the effect that the size of the picture contour of a test marker is consistent with that in the theoretical design can be ensured even if the first exposure and the second exposure have position deviation. Therefore, the substrate marker manufacturing method can improve the accuracy of substrate marker manufacturing, reduce the difficulty in product monitoring, and reduce the production cost.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate and a marking method for a substrate. Background technique [0002] With the continuous improvement of production technology, the display panel production line has developed from the first generation line (glass substrate size is 300mm×400mm) to today’s tenth generation line (glass substrate size is 2850mm×3050mm), and new products are constantly being developed and put into production , the difficulty of product monitoring and management has intensified. Such as figure 1 As shown, in order to enable the test equipment to detect the relative position of the display panel on the substrate, each display panel is designed with test marks around the display area. [0003] In order to improve the utilization rate of the glass substrate, the area of ​​the display area is designed to be larger and larger. Limited by the precision of the exposure equipment, some test mark...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/44
CPCG03F1/38G03F1/44G03F7/70466G03F7/70633G03F7/20G03F7/40G03F7/42
Inventor 魏小丹张兴强赵巍闫虹旭
Owner BOE TECH GRP CO LTD
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