Sapphire substrate polishing agent used for double-side polishing machine

Abstract

The invention relates to a sapphire substrate polishing agent used for a double-side polishing machine. The polishing agent is specially used for the double-side polishing machine and is a composition containing silicon dioxide, an oxidation agent, an alkaline composition, a surfactant and water. The oxidation agent can oxidize metal impurities on a workpiece surface, thereby preventing a polished workpiece surface from being polluted by metal and improving polishing quality of the workpiece surface. The surfactant contains an anionic surfactant and a nonionic surfactant. Through addition of the surfactant, the polishing agent has lower surface tension, higher fluidity and higher penetrability so that friction resistance during polishing can be reduced and a better lubricant effect can be achieved. In addition, compared with a single-side polishing machine, the double-side polishing machine is higher in polishing efficiency. Not only is the polishing efficiency increased but also a better polishing effect is achieved. In addition, a production cost can be reduced.

Description

technical field [0001] The invention relates to a sapphire substrate polishing liquid for a double-sided polishing machine, which is specially used for the double-sided polishing machine. Background technique [0002] Sapphire single crystal (Sapphire) is a multifunctional oxide crystal with excellent optical properties, physical properties and chemical properties. Compared with natural gemstones, it has high hardness, second only to diamond, high melting point, good light transmission, excellent thermal conductivity and electrical insulation, good wear resistance, stable chemical properties, and high transmittance to infrared rays. Therefore, it is widely used in optoelectronics, communications, national defense and other fields, such as precision instruments, infrared light-transmitting materials in the aerospace industry, windows and mirrors for lasers, epitaxial substrates for semiconductor silicon, epitaxial storage materials for semiconductor silicon nitride, Insulati...

AI Technical Summary

Problems solved by technology

However, due to the high hardness and brittleness of sapphire and the difficulty in machining, it is generally encountered in t