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A real-time focusing method and device based on keyence

A real-time focusing and striping technology, applied in optics, optomechanical equipment, instruments, etc., can solve the problems of unable to meet the needs of fast real-time focusing and high price, and achieve the effect of precise focusing, low cost and fast focusing

Active Publication Date: 2017-01-18
JIANGSU YSPHOTECH INTERGRATED CIRCUIT EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The active focus speed has improved significantly, but it still cannot meet the needs of fast real-time focus, and the price is high

Method used

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  • A real-time focusing method and device based on keyence
  • A real-time focusing method and device based on keyence
  • A real-time focusing method and device based on keyence

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Experimental program
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Embodiment Construction

[0019] The present invention will be further described below in conjunction with the accompanying drawings.

[0020] Such as image 3 As shown, the specific steps of this Keyence-based real-time focusing method are:

[0021] (1) The scanning lithography machine exposes according to the strip, and the strip is a rectangular exposure area, namely image 3 The long rectangle indicated by the thick solid line in the middle, exposes one strip at a time, and exposes one strip after another sequentially. All the strips constitute the entire exposure area, and the entire exposure area is image 3 The large rectangular area indicated by the thick solid line in the middle;

[0022] (2), determine the real-time focus area according to the exposure area in step (1), namely image 3 In the large rectangular area indicated by the thin solid line, the real-time focus area is divided into several small rectangular areas according to a certain width and height as the area to be fitted, name...

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Abstract

The invention discloses a real-time focusing method and a real-time focusing device based on Keyence. A scanning type photoetching machine is used for exposing according to strips and a whole exposure region is composed of all the strips; the exposure region is used for determining a real-time focusing region and dividing the real-time focusing region into regions to be fitted; before one strip is exposed, focal plane values of four vertex positions of all the regions to be fitted crossed with the strip are measured by using the Keyence, and a focal plane equation of the regions to be fitted is obtained by fitting of matrix manipulation; when one strip is exposed, the fitted regions are found and the focal plane values are obtained by the focal plane equation; and accurate focusing is realized by moving an exposure base Wafer. The real-time focusing method and the real-time focusing device based on the Keyence are low in cost, and accurate and rapid in focusing, and the ultra-rapid focusing is realized; and the accurate or rapid focusing is realized in actual application by adjusting the sizes of the regions to be fitted.

Description

technical field [0001] The invention relates to a Keyence-based real-time focusing method and device, which are mainly used in high-speed laser direct imaging lithography machine systems, and belong to the technical field of ultra-large-scale integrated circuit equipment industry. Background technique [0002] High-speed lithography machines not only have high requirements on the quality of the exposed graphics, but also have high requirements on the production capacity of the equipment. The focusing system is one of the very important modules in the lithography machine. Its performance not only affects the quality of the exposed graphics but also directly affects the exposure throughput. [0003] Inaccurate focus will cause blurred and distorted graphics, which will eventually lead to chip scrapping. If the focusing speed is too slow, it will seriously affect the exposure productivity, resulting in a decline in equipment performance. There is a constant search in the indu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/207
Inventor 王宇航曹旸
Owner JIANGSU YSPHOTECH INTERGRATED CIRCUIT EQUIP CO LTD
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