Hydrophobic bank
A technology of cofferdams and areas, applied in the direction of electrical components, electrical solid devices, semiconductor/solid device manufacturing, etc., can solve problems such as high leakage equipment, poor color uniformity and/or light emission efficiency
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Embodiment 1
[0072] Embodiments generally provide single-dam architectures, eg, with longer path lengths, thereby reducing leakage currents. For OLEDs, this path length can be between the anode surface (eg, ITO) and the HIL-IL-EL consistent fluidic pinning point. These longer path lengths along the highly resistive HIL can create highly resistive paths for any potential parasitic leakage currents and / or non-emitting edge device diodes. This cofferdam structure is shown to be an improvement in OLED lifetime stability.
[0073] Various bank fabrication processes for this embodiment are investigated in the following description. For example: (i) a hydrophobic dam developed by secondary layer patterning and partial reactive ion etching (RIE); (ii) an unpatterned hydrophobic dam with a partially exposed pixel edge for the RIE masking layer ; (iii) a double development process; (iv) a double mask process with a single patterned layer; (v) a single mask partial transmission (leakage) process wi...
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