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A preparation method of germanium carbide film with high hardness and variable refractive index

A technology of refractive index and high hardness is applied in the field of preparation of germanium carbide thin films, which can solve the problems of not fully satisfying the practical application requirements of infrared hard protective films and low film hardness, and achieve the effect of simple and controllable reactive sputtering process.

Active Publication Date: 2018-03-30
THE 3RD ACAD 8358TH RES INST OF CASC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the hardness of the films prepared by the above two methods is low (6-9GPa), which does not fully meet the practical application requirements of infrared hard protective films.

Method used

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  • A preparation method of germanium carbide film with high hardness and variable refractive index
  • A preparation method of germanium carbide film with high hardness and variable refractive index
  • A preparation method of germanium carbide film with high hardness and variable refractive index

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preparation example Construction

[0030] The concrete steps of the preparation method of the germanium carbide film with high hardness and variable refractive index provided by the present invention are as follows:

[0031] 1) Substrate cleaning

[0032] First, wipe the substrate with a degreasing gauze dipped in a mixture of alcohol and ether (1:1 by volume); then use a degreasing gauze dipped in a polishing solution to polish the substrate; Liquid (volume ratio: 1:1) degreased gauze and absorbent cotton cloth to wipe the surface of the substrate until it is wiped clean.

[0033] 2) Pre-sputtering

[0034] use figure 1 The ion beam reactive sputtering coating device shown was used to coat Ge 1-x C x film.

[0035] Put the cleaned substrate into an ion beam sputtering coating machine, use Ge with a purity of 99.95% as the target material, Ar with a purity of 99.999% as the ion source working gas, and CH with a purity of 99.999% 4 as a reactive gas. Turn on the vacuum pump to evacuate, when the pressure ...

Embodiment 1

[0043] The preparation method of the germanium carbide film with high hardness and variable refractive index in this embodiment comprises the following steps:

[0044] 1) Select Ge with a diameter of 20 mm and a thickness of 1 mm as the substrate. First, wipe the substrate with a degreasing gauze dipped in a mixture of alcohol and ether (volume ratio 1:1), then use a degreasing gauze dipped in a polishing solution to polish the substrate, and then use a mixture of alcohol and ether in turn to polish the substrate. Liquid (1:1 by volume) absorbent gauze and absorbent cotton cloth to wipe the surface of the substrate until it is wiped clean;

[0045] 2) Pre-sputtering

[0046] Put the cleaned Ge substrate into an ion beam sputtering coating machine, use Ge with a purity of 99.95% as the target material, Ar with a purity of 99.999% as the ion source working gas, and CH with a purity of 99.999% 4 as a reactive gas. Turn on the vacuum pump to evacuate, when the pressure in the v...

Embodiment 2

[0051] This embodiment is similar to Embodiment 1, except that the ion source beam voltage in step 3) is 1000V, the beam current is 300mA, CH 4 The flow rate is 80sccm, and the coating time is 1h. Prepared Ge 1-x C x The hardness test curve of the film is as follows Figure 4 shown. The refractive index and extinction coefficient test analysis curve of the film is as follows: Figure 5 shown. Prepared Ge 1-x C x The hardness of the film is 9.2GPa, the refractive index of 8-12um is about 3.35, and the extinction coefficient is below 0.01.

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Abstract

The invention provides a method for preparing a high-hardness germanium carbide film (Ge1-xCx) with a variable refractive index and belongs to a preparation technology of high-performance infrared hard protective films. An ion beam reactive sputtering method is adopted, and the refractive index and hardness of the prepared Ge1-xCx film are adjusted by virtue of a method for controlling the ion source beam pressure, the ion source beam flow and the flow of the introduced reaction gas. The preparation method comprises the following steps: cleaning a substrate before coating, performing pre-sputtering before coating and depositing the Ge1-xCx film on the surface of the substrate by using the ion beam reactive sputtering method. The method disclosed by the invention is simple, rapid, effective, practical and high in operability. The prepared Ge1-xCx film is high in hardness, and the nano-indentation measurement result shows that the hardness of the film is between 8.0GPa and 11.0GPa. In addition, the refractive index of the film can change between 2.45 and 3.75, the infrared absorption amount is small, and the film is an ideal material used for the infrared hard protective film.

Description

technical field [0001] The invention belongs to the field of design and development of functional optical films, relates to the preparation technology of high-performance infrared hard protective films, and further relates to a preparation method of germanium carbide films with high hardness and variable refractive index. Background technique [0002] The development of supersonic infrared technology has put forward higher requirements for the infrared optical window, not only to have good infrared optical performance, but also to have good mechanical properties, which can withstand the aerodynamic heat and aerodynamic shock brought by high-speed flight . At this stage, the commonly used infrared windows (Si, Ge, ZnS) have the disadvantages of low hardness, high brittleness, and poor chemical corrosion resistance. Therefore, a high-performance infrared hard protective film must be deposited on the surface of the infrared window to meet the requirements of supersonic flight ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/06
CPCC23C14/0036C23C14/3442
Inventor 孙鹏张锋季一勤刘华松庄克文冷健杨明
Owner THE 3RD ACAD 8358TH RES INST OF CASC
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