Mild and moist cleansing water and preparation method thereof
A makeup remover with mild technology, applied in cosmetic preparations, dressing preparations, skin care preparations, etc., can solve the problems of high irritation, good cleaning power, and low irritation, so as to reduce irritation and avoid dry skin peeling effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0017] Composed of the following ingredients according to a certain mass percentage: butanediol: 8%; PEG-6 caprylic / capric glycerides: 6%; trimethylglycine (betaine): 1%; purslane: 5%; Tocopheryl Acetate: 0.05%; Dipotassium Glycyrrhizinate: 0.1%; Hydroxyphenyl Propionamide Benzoic Acid: 0.02%; Polyglutamic Acid: 0.08%; 1,2-Pentanediol: 0.05%; Deionized Water : 79.7%.
Embodiment 2
[0019] Composed of the following ingredients according to a certain mass percentage: butanediol: 12%; PEG-6 caprylic / capric glycerides: 2%; trimethylglycine (betaine): 4%; purslane: 2%; Tocopheryl Acetate: 0.15%; Dipotassium Glycyrrhizinate: 0.01%; Hydroxyphenyl Propionamide Benzoic Acid: 0.1%; Polyglutamic Acid: 0.03%; 1,2-Pentanediol: 2%; Deionized Water : 77.71%.
Embodiment 3
[0021] Composed of the following ingredients according to a certain mass percentage: butanediol: 9%; PEG-6 caprylic / capric glycerides: 10%; trimethylglycine (betaine): 5%; purslane: 1%; Tocopheryl Acetate: 0.08%; Dipotassium Glycyrrhizinate: 0.05%; Hydroxyphenylpropanamide: 0.001%; Polyglutamic Acid: 0.1%; 1,2-Pentanediol: 0.08%; Deionized Water : 74.689%.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com