Anti-allergy stress relief face mask essence containing saccharide isomerate and preparation method thereof

A technology of isomeric oligosaccharide and essence, applied in skin care preparations, pharmaceutical formulations, allergic diseases, etc., can solve the problems of reducing the occurrence of allergies, neglecting skin repair, etc., to resist skin allergies and provide immune stress. , The effect of preventing the loss of skin moisture and electrolytes

Inactive Publication Date: 2015-04-08
上海圣婕化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Existing skin anti-allergy soothing products often only specifically inhibit the inflammation that occurs due to sensitivity, ignoring the repair of the skin's own damaged barrier function, so it is difficult to fundamentally reduce the occurrence of sensitivity

Method used

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  • Anti-allergy stress relief face mask essence containing saccharide isomerate and preparation method thereof
  • Anti-allergy stress relief face mask essence containing saccharide isomerate and preparation method thereof
  • Anti-allergy stress relief face mask essence containing saccharide isomerate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] In order to better understand the technical scheme of the present invention, the inventors of the present invention will describe in detail below through specific examples:

[0025] raw material

Example 1

Example 2

Example 3

Comparative example

isooligosaccharide

1.0

1.5

0.5

0

Olive Fruit Water

2.0

1.5

2.0

2.0

Crumpled Carrageen Extract

0.5

0.5

1.0

0.5

tremella polysaccharide

1.0

2.0

0.5

1.0

Hydrolyzed Sclerotinia

0.4

0.5

0.4

0.4

panthenol

1.0

0.5

0.5

1.0

Glycerin

6.0

5.0

6.0

6.0

Butanediol

8.0

8.0

8.0

8.0

carbomer

0.05

0.02

0.03

0.05

Aminomethyl propanol

0.05

0.02

0.03

0.05

Methylparaben

0.2

0.2

0.2

0.2

Preservative Microcare MTI

0.19

0.15

0.15

0.19

Dipotassium glycyrrh...

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PUM

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Abstract

The invention discloses anti-allergy stress relief face mask essence containing saccharide isomerate. By adding saccharide isomerate, the essence can be used for effectively and immediately reduce inflammatory response and meanwhile repairing damaged skin barriers for a long time, reconstructing the skin structure, relieving and calming skin and enhancing the immunity of inner skin to an external stimulation source, so that allergy symptoms can be fundamentally reduced or avoided. Meanwhile, skin moisture can be further supplemented, so that the skin is recovered to healthy, balanced and beautiful states. The invention further discloses a preparation method of the anti-allergy stress relief face mask essence containing saccharide isomerate.

Description

technical field [0001] The invention belongs to the field of cosmetics and relates to a facial mask essence, in particular to an anti-allergic and soothing facial mask essence containing heterogeneous oligosaccharides and a preparation method thereof. Background technique [0002] With the rapid development of social economy, people's living standards are getting higher and higher, more and more women begin to pay attention to beauty and make-up, and start to use skin care products to modify their skin problems. However, due to uneven levels of products used, some products exceed the burden on the skin, coupled with the continuous deterioration of the living environment, it is easy to irritate and sensitize the skin, and seriously cause chronic damage. Statistics show that 50-60% of Chinese people today think they have sensitive skin, which was only 30% in the 1980s, and the human skin in big cities is more sensitive and inflammatory. [0003] The main characteristics of sk...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/97A61K8/60A61Q19/00A61P37/08
Inventor 杨凯谢淑春
Owner 上海圣婕化妆品有限公司
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