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Chemical vapor deposition equipment

A technology of chemical vapor deposition and equipment, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve unfavorable chemical vapor deposition equipment maintenance and cleaning and shaping, heating platform support rod wear, tilt, bottom sealing Point 5 damage and other problems, to achieve the effect of easy maintenance, cleaning and shaping, and quality assurance

Inactive Publication Date: 2015-04-15
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, such as figure 2 As shown, the heating platform 2 and the heating platform support rod 4 are of an integrated structure. When the heating platform 2 is disassembled, the heating platform support rod 4 needs to be disassembled as a whole. damage, resulting in poor sealing at the bottom, and at the same time, the support rod 4 of the heating platform is prone to wear and tilt, resulting in damage to components, which is not conducive to the maintenance and cleaning of chemical vapor deposition equipment

Method used

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Embodiment Construction

[0027] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0028] The present invention provides a chemical vapor deposition equipment, comprising: a reaction chamber 100, a heating platform 200 arranged in the reaction chamber 100, a heating platform support seat 301 arranged below the heating platform 200, a heating platform support seat 301 arranged in the reaction chamber 100, The heating platform support bar 302 below the heating platform support base 301.

[0029] Wherein, the heating platform 200 and the heating platform support seat 301 are separate components, and the heating platform 200 and the heating platform support seat 301 are respectively provided with at least two threaded holes, through which the hollow hexagon socket bolt 400 is used to fasten the The heating platform 200 is fixed ...

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Abstract

The invention provides chemical vapor deposition equipment. The chemical vapor deposition equipment comprises a reaction cavity (100), a heating platform (200) arranged in the reaction cavity (100), a heating platform supporting seat (301) arranged below the heating platform (200) and a heating platform supporting rod (302) arranged below the heating platform supporting seat (301), wherein corresponding threaded holes are respectively formed in the heating platform (200) and a heating platform supporting plate (300), the heating platform (200) and the heating platform supporting plate (300) are fixed together by using hollow inside hexagonal bolts (400) through the threaded holes, and a heating wire (700) and a thermocouple (800) are connected to the heating platform (200) through clamping sleeve structures (500). The heating platform of the chemical vapor deposition equipment can be disassembled independently, so that the maintenance, the cleaning and the shaping of the chemical vapor deposition equipment are facilitated.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a chemical vapor deposition equipment. Background technique [0002] With the development of electronic technology, in order to reduce the size of the circuit, the method of increasing the number of deposited layers is often used to expand in the vertical direction. These added layers play a variety of roles in devices and circuits, mainly as gate electrodes, interlayer insulating films for multilayer wiring, metal wiring, resistors, surface passivation layers, etc. The quality of the deposited films in these added layers will have an impact on the electrical and mechanical properties of the device, which in turn will affect the yield and yield of the device. [0003] Thin film deposition methods generally include chemical vapor deposition (CVD, Chemical Vapor Deposition) and physical vapor deposition (PVD, Physical Vapor Deposition). Among them, chemical vapor deposi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/46
CPCC23C16/46
Inventor 李金明
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD