Device and method for metal filling

A technology for metal and storage tanks, which is applied in the field of metal filling devices and filling, which can solve the problems of affecting the accuracy of filling, the purity of filling metal, the inability to realize metal filling, and the loss of filling metal, so as to achieve a good filling effect , cost avoidance, high filling accuracy

Inactive Publication Date: 2015-05-13
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, since in some applications it is necessary to use a single-port capillary, that is, the capillary that needs to be filled with metal has only one end opening, in this case, the above-mentioned high-purity gallium filling device cannot realize metal filling
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  • Device and method for metal filling

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Embodiment

[0023] Adopt the metal filling device of the present invention to fill 20 grams of metal potassium in the single-port capillary, main steps are as follows:

[0024] (1) Get 28 grams of molten potassium according to calculations, inject a part of potassium into the storage tank until the potassium liquid level is slightly higher than the nozzle of the filling pipeline inside the storage tank; after the injected potassium is cooled and solidified, inject the remaining Potassium and wait for it to cool and solidify;

[0025] (2) Connect the single-port thin tube to be filled into the filling pipeline through the quick connector, make the vacuum valve and the exhaust valve in the open state, and the intake valve in the closed state, and evacuate through the vacuum pipeline;

[0026] (3) Close the vacuum valve and the exhaust valve, heat the temperature of the storage tank and the filling pipeline to 80°C through the heating module and the heating wire, so that the potassium in the...

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Abstract

The invention relates to a device and method for filling a container with material, and provides a device and method for metal filling, in order to solve the metal filling problem of a single-port thin pipe and ensure a good filling effect. The device for metal filling comprises a storage tank, a filling pipeline, a vacuumizing pipeline, an air inlet pipe, an air inlet valve, an exhaust valve and a vacuumizing valve, wherein a heating module is arranged at the outer part of the storage tank; a heating wire is arranged at the outer part of the filling pipeline. The method for metal filling comprises the following steps: (1), pouring metal into the storage tank and solidifying; (2), connecting a single-port thin pipe to be filled; (3), heating the corresponding structure to above the melting point of the metal to be poured; (4), feeding inert gas to pour the metal. According to the device and the method for metal filling, the metal filling problem of the single-port thin pipe can be solved, in the filling process, the metal is prevented from being oxidized and polluted, and no air column and bubble is generated, quantitative filling is easy to implement, the filling accuracy is high, the repeatability is excellent, and a higher cost of adopting a special valve is avoided.

Description

technical field [0001] The invention relates to a device and method for filling substances into a container, in particular to a metal filling device and a filling method. Background technique [0002] In scientific research and production, in order to meet certain specific requirements, it is sometimes necessary to fill the thin tube with low melting point metals such as sodium and potassium. Theoretically, it can be considered to melt the low melting point metal into a liquid state before filling. However, due to the existence of capillary phenomenon, the method of direct filling will cause the liquid metal to be unable to be successfully filled into the thin tube. Even if known methods such as centrifugation and vibration are used, it is very easy to generate gas columns or Air bubbles, unable to obtain a better filling effect. [0003] At the same time, due to the active chemical properties of most low-melting point metals, they are easily oxidized, so they are easily ox...

Claims

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Application Information

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IPC IPC(8): B67C3/00
CPCB67C3/00
Inventor 徐迟俞晓琛谢淳王树兴米争峰于团结王明政
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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