A high-performance light-to-heat conversion multi-element alloy nitride thin film and its preparation method
A technology of high-entropy alloys and nitride ceramics, which is applied in metal material coating technology, ion implantation plating, coating, etc., and can solve problems such as decreased bonding force, decreased optical properties, and peeling
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0029] The composition is 1:1:1:1 equimolar ratio NbTiAlSi quaternary alloy target, using vacuum magnetron sputtering coating process, filled with working gas Ar and reactive gas N 2 , by changing the working pressure and sputtering time to obtain uniform multi-element alloy nitride films with different thicknesses. Specifically include the following steps:
[0030] Step 1: Put the quartz glass sheet (to facilitate the film thickness test) and the polished stainless steel substrate into alcohol and deionized water for 15 minutes, and repeat the above process twice;
[0031] Step 2: Dry the cleaned substrate and place it on the sample stage corresponding to the vacuum chamber, place the prepared quaternary alloy target on the evaporation source of the vacuum chamber and connect it to a DC power supply;
[0032] Step 3: Close the magnetron sputtering vacuum chamber, when the vacuum degree is lower than 1.0×10 -3 Pa, filled with 16sccm of Ar and 8sccm of N 2 ;
[0033] Step 4...
Embodiment 2
[0036] The composition is 1:1:1:1 equimolar ratio NbTiAlSi quaternary alloy target, using vacuum magnetron sputtering coating process, filled with working gas Ar and reactive gas N 2 , by changing the working pressure and sputtering time to obtain uniform multi-element alloy nitride films with different thicknesses. Specifically include the following steps:
[0037] Step 1: Put the quartz glass sheet (to facilitate the film thickness test) and the polished stainless steel substrate into alcohol and deionized water for 15 minutes, and repeat the above process twice;
[0038] Step 2: Dry the cleaned substrate and place it on the sample stage corresponding to the vacuum chamber, place the prepared quaternary high-entropy alloy target on the evaporation source of the vacuum chamber and connect it to a DC power supply;
[0039] Step 3: Close the magnetron sputtering vacuum chamber, when the vacuum degree is lower than 1.0×10 -3 Pa, filled with 20sccm of Ar and 6sccm of N 2 ;
...
Embodiment 3
[0044] The composition is 1:1:1:1 equimolar ratio NbTiAlSi quaternary high-entropy alloy target, using vacuum magnetron sputtering coating process, filled with working gas Ar and reaction gas N 2 , by changing the working pressure and sputtering time to obtain uniform high-entropy alloy nitride films with different thicknesses. Specifically include the following steps:
[0045] Step 1: Put the quartz glass sheet (to facilitate the film thickness test) and the polished stainless steel substrate into alcohol and deionized water for 15 minutes, and repeat the above process twice;
[0046] Step 2: Dry the cleaned substrate and place it on the sample stage corresponding to the vacuum chamber, place the prepared quaternary alloy target on the evaporation source of the vacuum chamber and connect it to a DC power supply;
[0047] Step 3: Close the magnetron sputtering vacuum chamber, when the vacuum degree is lower than 1.0×10 -3 Pa, filled with 16sccm of Ar and 8sccm of N 2 ;
[...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com