Laser drilling method for amorphous silicon solar cell glass substrate
A laser drilling and glass substrate technology, applied in laser welding equipment, welding equipment, metal processing equipment, etc., can solve the problems of easily polluted membrane surface and high equipment cost
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[0019] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0020] Such as figure 1 , 2 As shown, the embodiment of the present invention provides a laser drilling method for the glass substrate of an amorphous silicon solar cell. The film surface of the glass substrate 12 coated with the film layer 11 is placed upwards, and then from the edge of the through hole 13 to be drilled to the The film layer in a circular ring 14 is removed, and then in the circular ring where the film layer is removed, the laser drills holes in layers upward from the lower surface of the glass substrate.
[0021] In this embodiment, the plated film layer has three layers a, b, ...
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