Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A double turntable mechanism

A turntable mechanism and double turntable technology, applied in assembly machines, metal processing, metal processing equipment, etc., can solve the problems of slow speed, low work efficiency, and easy fatigue of workers.

Active Publication Date: 2017-08-08
BOZHON PRECISION IND TECH CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] (1) It is inconvenient to pick up and install with small tweezers, the speed is slow, the keys and gaskets are easy to fall off, the workers are prone to fatigue, and the work efficiency is low
[0006] (2) When using small tweezers to pick up the button and put it into the mounting hole, it is easy to cause the center of the button to deviate from the mounting hole
[0007] (3) The thickness of the gasket filled between the button and the button bracket is not suitable, which affects the effect of the button
This requires a lot of labor, the entire assembly line is longer, and the data information processing on the entire assembly line is more troublesome.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A double turntable mechanism
  • A double turntable mechanism
  • A double turntable mechanism

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] Examples, see attached Figure 1-12 , a double turntable mechanism, which includes a bottom plate 1, on which a turntable mechanism a and a turntable mechanism b are installed, and six groups of product carriers aI are uniformly installed on the turntable mechanism a; on the turntable mechanism a, evenly installed There are six groups of product carriers bⅡ;

[0046] The turntable mechanism a and the turntable mechanism b have the same structure, and the turntable mechanism a includes a sextant a2, a rotating shaft a3, a turntable a4, a rotating photoelectric sensor a5, a rotating optical fiber sensor a6, a rotating optical fiber sensor fixing frame a7, a rotating sensor slice a8, four-way rotary joint a9, bridge connecting plate a10 and support column a11, the sextant a is installed at the bottom of the bottom plate, and the turntable a is installed on the output end of the sextant a through the rotating shaft a to realize indexing intermittent rotation, And the rotat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a double-turn-plate mechanism. According to the double-turn-plate mechanism, a turn plate mechanism a and a turn plate mechanism b are installed on a base plate; six groups of product carriers a are evenly arranged on the turn plate mechanism a, and six groups of product carriers b are evenly arranged on the turn plate mechanism b; a lower CCD mechanism a and a lower suction nozzle mechanism a are installed on the base plate and located on the lower portion of the front right side of the turn plate mechanism a, and a lower CCD mechanism b, a lower CCD mechanism c and an ejecting mechanism are installed on the base plate and located on the lower portion of the back side of the turn plate mechanism a; a lower CCD suction nozzle mechanism is installed on the base plate and located on the lower portion of the front side of the turn plate mechanism b, a lower suction nozzle mechanism b is arranged on the base plate and located on the lower portion of the front right side of the turn plate mechanism b, a lower CCD mechanism and a lower suction nozzle mechanism c are arranged on the base plate and located on the lower portion of the rear right side of the turn plate mechanism b, and a lower suction nozzle mechanism d is installed on the base plate and located on the lower portion of the rear side of the turn plate mechanism b. By the adoption of the mechanism, automatic key assembly is achieved, assembling efficiency is high, labor is saved, and productivity is improved.

Description

[0001] Technical field: [0002] The invention relates to the field of turntable mechanism equipment, in particular to a double turntable mechanism. [0003] Background technique: [0004] In the manufacturing process of electronic products, such as mobile phones, it is necessary to assemble buttons to the electronic products. In some small-scale factories, the assembly of the keys of electronic products depends on the workers to use tweezers to pick up the keys and place them in the corresponding housing mounting holes, and then the workers use tweezers to pick up the small gaskets of the keys and place them on the keys. The center of the button, and finally lock the button bracket to the product with screws, and fix the button to the product from the back. Assembling buttons has the following disadvantages like this: [0005] (1) It is inconvenient to pick up and install with tweezers, the speed is slow, the buttons and gaskets are easy to fall off, the workers are prone to...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B23P19/00
CPCB23P21/006
Inventor 吕绍林汪炉生李忠夏俊明占枝武
Owner BOZHON PRECISION IND TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products