Bidirectional deposition coating device and coating method

A technology of a coating device and a coating cavity, which is applied in the field of bidirectional deposition coating devices, can solve the problems that the failure rate of the turning mechanism cannot be ignored, the increase of design and manufacturing costs, the scratches on the surface of the substrate, etc., to achieve the improvement of coating efficiency and quality, and low machine cost. , the effect of reducing the coating process

Active Publication Date: 2015-08-26
OPTORUN SHANGHAI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

3) During the process of step B and step C, factors that affect product yield such as scratches on the surface of some substrates often occur
The method of overturning the workpiece umbrella holder certainly has its own advantages, but it is not difficult to see that this me...

Method used

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  • Bidirectional deposition coating device and coating method
  • Bidirectional deposition coating device and coating method
  • Bidirectional deposition coating device and coating method

Examples

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Embodiment

[0019] Example: such as figure 1 As shown, the bidirectional deposition and coating device in this embodiment includes a coating chamber 1 . A workpiece umbrella frame 3 for carrying a substrate 2 is arranged inside the coating chamber 1 . The central position of the workpiece umbrella stand 3 is provided with a rotating mechanism 8, and the rotating mechanism 8 rotates through an external driving device, and the workpiece umbrella stand 3 can rotate at a uniform speed with the rotating mechanism 8. The below of workpiece umbrella frame 3 is provided with evaporation source 5 and ion source 7, and wherein ion source 7 is used for assisting evaporation source 5 to make evaporation film material be deposited on one side surface of substrate 2 (in figure 1 Indicated as the lower surface of the substrate 2).

[0020] The top of the workpiece umbrella frame 3 is provided with a sputtering target 4 and a radio frequency source 6, the sputtering target 4 is arranged on the top of t...

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Abstract

The invention relates to the technical field of film preparation and in particular to a bidirectional deposition coating device and a coating method. The bidirectional deposition coating device is characterized in that a sputtering target material and an evaporation source are respectively and fixedly arranged above and below a workpiece umbrella stand; the evaporation source below the workpiece umbrella stand is under the auxiliary action of an ion source corresponding to the evaporation source so as to coat the surface on one side of a substrate; the sputtering target material above the workpiece umbrella stand is excited by a radio source corresponding to the sputtering target material and is used for coating the surface of another side of the substrate. The bidirectional deposition coating device has the advantages that double-surface simultaneous coating can be achieved, the purpose of simultaneously depositing two membrane material sources at one moment can be achieved, the coating procedures of the substrate requesting double-surface coating can be reduced, and the coating efficiency and quality can be improved.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a bidirectional deposition coating device and a coating method. Background technique [0002] With the development of coating technology, higher requirements are put forward for film quality and coating efficiency. Many coated products, such as optical lenses, optical lenses, etc., usually require double-sided coating on their substrates. For these products that require double-sided coating, the current conventional process is generally to coat the films on both surfaces of the substrate successively through two coatings; that is, to perform the following four steps A, B, C, and D: One surface is coated (A), the substrate is removed from the fixture after the coating is completed (B), the substrate is reversed and the fixture is reinstalled (C), and then the other surface of the substrate is coated (D). The above process has the following points to be improved: 1)...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/24
Inventor 李志勇
Owner OPTORUN SHANGHAI CO LTD
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