Two-way deposition coating device and coating method

A technology of a coating device and a coating cavity, which is applied in the field of bidirectional deposition coating devices, can solve the problems such as the failure rate of the flipping mechanism cannot be ignored, increase the design and manufacturing cost, affect the product yield rate, etc., and achieve the improvement of coating efficiency and quality. The effect of reducing the coating process

Active Publication Date: 2017-12-08
OPTORUN SHANGHAI CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

3) During the process of step B and step C, factors that affect product yield such as scratches on the surface of some substrates often occur
The method of overturning the workpiece umbrella holder certainly has its own advantages, but it is not difficult to see that this method is actually divided into two times for the coating on the two surfaces of the substrate; in addition, the existence of the overturning mechanism in the coating chamber increases the Design and manufacturing costs, and the failure rate of the flip mechanism cannot be ignored

Method used

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  • Two-way deposition coating device and coating method
  • Two-way deposition coating device and coating method
  • Two-way deposition coating device and coating method

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Embodiment

[0019] Example: such as figure 1 As shown, the bidirectional deposition and coating device in this embodiment includes a coating chamber 1 . A workpiece umbrella frame 3 for carrying a substrate 2 is arranged inside the coating chamber 1 . The central position of the workpiece umbrella stand 3 is provided with a rotating mechanism 8, and the rotating mechanism 8 rotates through an external driving device, and the workpiece umbrella stand 3 can rotate at a uniform speed with the rotating mechanism 8. The below of workpiece umbrella frame 3 is provided with evaporation source 5 and ion source 7, and wherein ion source 7 is used for assisting evaporation source 5 to make evaporation film material be deposited on one side surface of substrate 2 (in figure 1 Indicated as the lower surface of the substrate 2).

[0020] The top of the workpiece umbrella frame 3 is provided with a sputtering target 4 and a radio frequency source 6, the sputtering target 4 is arranged on the top of t...

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Abstract

The invention relates to the technical field of thin film preparation, especially a two-way deposition coating device and a coating method, characterized in that: a sputtering target and an evaporation source are respectively fixed above and below the umbrella frame of the workpiece, and are located below the umbrella frame of the workpiece The evaporation source is assisted by the corresponding ion source to coat one side surface of the substrate, and the sputtering target located above the workpiece umbrella is excited by the corresponding radio frequency source and The other side surface of the substrate is coated. The advantage of the present invention is: can realize the two-way deposition vacuum coating device of double-sided simultaneous coating, to achieve simultaneous deposition of two film material sources at the same time; reduce the coating process of the substrate that needs double-sided coating, contribute to the coating efficiency and Quality improvement.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a bidirectional deposition coating device and a coating method. Background technique [0002] With the development of coating technology, higher requirements are put forward for film quality and coating efficiency. Many coated products, such as optical lenses, optical lenses, etc., usually require double-sided coating on their substrates. For these products that require double-sided coating, the current conventional process is generally to coat the films on both surfaces of the substrate successively through two coatings; that is, to perform the following four steps A, B, C, and D: One surface is coated (A), the substrate is removed from the fixture after the coating is completed (B), the substrate is reversed and the fixture is reinstalled (C), and then the other surface of the substrate is coated (D). The above process has the following points to be improved: 1)...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/24
Inventor 李志勇
Owner OPTORUN SHANGHAI CO LTD
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