Mask

A mask and detection device technology, applied in the field of masks, can solve the problems of high leakage rate of masks, inability of masks to block pm2.5 particles, and poor adhesion

Inactive Publication Date: 2015-09-23
杨海丹
View PDF7 Cites 26 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The protective effect of anti-microparticle masks is often not guaranteed
There are many factors that affect the protective effect of masks against microparticles: low filtration efficiency of mask materials, high leakage rate of ma

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask
  • Mask
  • Mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Embodiment 1: as figure 2 As shown, the mask main body 1 is equipped with a measurement light source 3 which is an infrared light-emitting diode (IRED); the optical sensor 2 is an optoelectronic transistor. The two are arranged diagonally. The specific area where the measurement light source 3 intersects with the optical axis of the optical sensor 2 is a dotted shaded area. Directional emission of LED light to produce reflected light when passing through the airborne particles in a specific area. The optical sensor 2 detects the light reflected by the particles, and transmits the voltage analog signal output by the reflected light to the computing device through the data line. According to the principle that the analog voltage is proportional to the obtained dust concentration, the linear relationship between the voltage analog signal and the air particle concentration (such as image 3 Shown), calculate the concentration or density of particulate matter. Then the ...

Embodiment 2

[0036] Embodiment 2: as figure 2 The measuring light source 3 installed in the shown mask main body 1 is a laser. The specific area where the laser light source intersects with the optical axis of the optical sensor 2 is a dotted shaded area. Scattering occurs when laser light hits particulate matter in the air passing through a specific area. The optical sensor 2 transmits the pulse signal output by the scattered light to the computing device through the data line for digital signal processing and calculation to obtain the concentration or density of particulate matter. Then the calculation result is transmitted to the display device for display.

Embodiment 3

[0037] Embodiment 3: as Figure 4 , Figure 5As shown, the microparticle detection device is completely placed 16 outside the mask. Mask main body 1 has opening. The opening connects the "connecting pipe" 15 to communicate with the microparticle detection device, so that the gas in the part of the mouth mask and the face can reach the detection device. The connecting pipe 15 can be removed and the opening can be closed. The opening in this embodiment is the breathing valve 12 . The connecting pipe end 13 is made of elastic material and can be fastened and closely connected with the breathing valve 12 . The air in the airtight space between the mask main body 1 and the face passes through the air hole 14 of the breathing valve 12 and the connecting pipe 15 set on the outside of the breathing valve 12 to the microparticle detection device along with exhalation.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a mask with a detection device. The concentration of microparticles (pm2.5 and the like) and other harmful gas in gas in the closed cavity formed between a mask body and the face of a person can be measured through the detection device, and thus the filtering effect can be learnt. A filtering device is adjusted according to a microparticle detection result, and thus the protection performance and the wearing feeling of the mask are perfectly combined.

Description

technical field [0001] The invention is a mask with a microparticle detection device. It involves the field of mask and micro particle detection. The microparticle detection device is built-in and / or externally placed in the mask. The sensor of the particle detection device can sense the particles contained in the gas in the closed space formed by the inside of the mask main body 1 and the human face, and transmit the induction signal to the calculation unit 8 through the transmission unit to obtain the concentration of the particles, and display it on the display its concentration. When the concentration value reaches a certain level, the reminder unit inside the detection device will send out a reminder signal. The particulates referred to in this patent can be particulates such as pm10, pm2.5 and so on. Background technique [0002] There are currently no masks with detection devices on the market. The protective effect of anti-microparticle masks is often not guaran...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A62B7/10
CPCA62B7/10
Inventor 不公告发明人
Owner 杨海丹
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap