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Coating device

A coating device and coating cavity technology, which are applied in sputtering coating, ion implantation coating, gaseous chemical coating and other directions to achieve the effect of improving uniformity and density and improving coating unevenness

Inactive Publication Date: 2015-09-30
NINGBO ADVANCED MEMORY TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the evolution of semiconductor process technology, for example, when the size of the wafer is expanded from 12 inches to 18 inches or even larger, it becomes more difficult to maintain the consistency of the thickness of the deposited film on such a large wafer

Method used

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Embodiment Construction

[0023] A number of implementations of the present invention will be disclosed below with the accompanying drawings. For clarity, many practical details will be described together in the following description. It should be understood, however, that these practical details should not be used to limit the invention. In addition, the drawings are for illustration purposes only and are not drawn to original scale. For ease of understanding, the same components will be described with the same symbols in the following description.

[0024] As used herein, the terms "substantially", "around", "about" or "approximately" shall generally mean within a percent of a given value or range Within 20%, preferably within 10%, and more preferably within 5%. If there is no explicit statement in the text, the numerical values ​​mentioned in it are regarded as approximate values, that is, the error or range indicated by "substantially", "about", "approximately" or "nearly".

[0025] In one or mo...

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PUM

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Abstract

The invention provides a coating device. The coating device comprises a coating chamber, a bearing platform, a plurality of high-frequency vibrating elements and at least a control unit, wherein the bearing platform is configured in the coating chamber and is used for accommodating a base material; the plurality of high-frequency vibrating elements are configured in the bearing platform; the vibration frequency of the high-frequency vibrating elements is more than 20kHz; the control units are electrically connected with at least a high-frequency vibrating element and are used for controlling the vibration frequency, vibration waveform and vibration amplitude of at least a high-frequency vibrating element so as to improve the coating uniformity of the base material.

Description

technical field [0001] The invention relates to a coating device. Background technique [0002] In the semiconductor manufacturing process, the deposition or coating process can be accomplished by physical vapor deposition (Physical Vapor Deposition, PVD) or chemical vapor deposition (chemical vapor deposition, CVD). Among them, physical vapor deposition is a technology that uses physical methods to gasify material sources into gaseous atoms, molecules or ionize into ions, and form a thin film of the same material as the material source on the surface of the substrate through low-pressure gas. Chemical vapor deposition is a method of using process gas to use chemical reaction to deposit the material to be formed on the substrate. [0003] At present, no matter whether physical vapor deposition or chemical vapor deposition is used, it is hoped that a thin film with as uniform thickness as possible can be deposited on the substrate. However, with the evolution of semiconduct...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C16/44
Inventor 吴孝哲
Owner NINGBO ADVANCED MEMORY TECH
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